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Bei Yu

Publications and source records attributed to Bei Yu.

At least 163 records · Page 9Linked to original sources

Automatic Layout Generation with Applications in Machine Learning Engine Evaluation

Machine learning-based lithography hotspot detection has been deeply studied recently, from varies feature extraction techniques to efficient learning models. It has been observed that such machine learning-based frameworks are providing satisfactory metal layer hotspot prediction results on known public metal layer benchmarks. In this work, we seek to evaluate how these machine learning-based hotspot detectors generalize to complicated patterns. We first introduce a automatic layout generation tool that can synthesize varies layout patterns given a set of design rules. The tool currently supports both metal layer and via layer generation. As a case study, we conduct hotspot detection on the generated via layer layouts with representative machine learning-based hotspot detectors, which shows that continuous study on model robustness and generality is necessary to prototype and integrate the learning engines in DFM flows. The source code of the layout generation tool will be available at https://github. com/phdyang007/layout-generation.

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CAD Tool Design Space Exploration via Bayesian Optimization

The design complexity is increasing as the technology node keeps scaling down. As a result, the electronic design automation (EDA) tools also become more and more complex. There are lots of parameters involved in EDA tools, which results in a huge design space. What's worse, the runtime cost of the EDA flow also goes up as the complexity increases, thus exhaustive exploration is prohibitive for modern designs. Therefore, an efficient design space exploration methodology is of great importance in advanced designs. In this paper we target at an automatic flow for reducing manual tuning efforts to achieve high quality circuits synthesis outcomes. It is based on Bayesian optimization which is a promising technique for optimizing black-box functions that are expensive to evaluate. Gaussian process regression is leveraged as the surrogate model in Bayesian optimization framework. In this work, we use 64-bit prefix adder design as a case study. We demonstrate that the Bayesian optimization is efficient and effective for performing design space exploration on EDA tool parameters, which has great potential for accelerating the design flow in advanced technology nodes.

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OpenMPL: An Open Source Layout Decomposer

Multiple patterning lithography has been widely adopted in advanced technology nodes of VLSI manufacturing. As a key step in the design flow, multiple patterning layout decomposition (MPLD) is critical to design closure. Due to the NP-hardness of the general decomposition problem, various efficient algorithms have been proposed with high quality solutions. However, with increasingly complicated design flow and peripheral processing steps, developing a high-quality layout decomposer becomes more and more difficult, slowing down the further advancement in this field. This paper presents OpenMPL [1], an open-source layout decomposition framework, with well-separated peripheral processing and the core solving steps. We demonstrate the flexibility of the framework with efficient implementations of various state-of-the-art algorithms, which enable us to reproduce most of the recent results on widely-recognized benchmarks. We believe OpenMPL can pave the road for developing layout decomposition engines and stimulate further researches on this problem.

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A Unified Approximation Framework for Compressing and Accelerating Deep Neural Networks

Deep neural networks (DNNs) have achieved significant success in a variety of real world applications, i.e., image classification. However, tons of parameters in the networks restrict the efficiency of neural networks due to the large model size and the intensive computation. To address this issue, various approximation techniques have been investigated, which seek for a light weighted network with little performance degradation in exchange of smaller model size or faster inference. Both low-rankness and sparsity are appealing properties for the network approximation. In this paper we propose a unified framework to compress the convolutional neural networks (CNNs) by combining these two properties, while taking the nonlinear activation into consideration. Each layer in the network is approximated by the sum of a structured sparse component and a low-rank component, which is formulated as an optimization problem. Then, an extended version of alternating direction method of multipliers (ADMM) with guaranteed convergence is presented to solve the relaxed optimization problem. Experiments are carried out on VGG-16, AlexNet and GoogLeNet with large image classification datasets. The results outperform previous work in terms of accuracy degradation, compression rate and speedup ratio. The proposed method is able to remarkably compress the model (with up to 4.9x reduction of parameters) at a cost of little loss or without loss on accuracy.

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Are Adversarial Perturbations a Showstopper for ML-Based CAD? A Case Study on CNN-Based Lithographic Hotspot Detection

There is substantial interest in the use of machine learning (ML) based techniques throughout the electronic computer-aided design (CAD) flow, particularly those based on deep learning. However, while deep learning methods have surpassed state-of-the-art performance in several applications, they have exhibited intrinsic susceptibility to adversarial perturbations --- small but deliberate alterations to the input of a neural network, precipitating incorrect predictions. In this paper, we seek to investigate whether adversarial perturbations pose risks to ML-based CAD tools, and if so, how these risks can be mitigated. To this end, we use a motivating case study of lithographic hotspot detection, for which convolutional neural networks (CNN) have shown great promise. In this context, we show the first adversarial perturbation attacks on state-of-the-art CNN-based hotspot detectors; specifically, we show that small (on average 0.5% modified area), functionality preserving and design-constraint satisfying changes to a layout can nonetheless trick a CNN-based hotspot detector into predicting the modified layout as hotspot free (with up to 99.7% success). We propose an adversarial retraining strategy to improve the robustness of CNN-based hotspot detection and show that this strategy significantly improves robustness (by a factor of ~3) against adversarial attacks without compromising classification accuracy.

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DeepBillboard: Systematic Physical-World Testing of Autonomous Driving Systems

Deep Neural Networks (DNNs) have been widely applied in many autonomous systems such as autonomous driving. Recently, DNN testing has been intensively studied to automatically generate adversarial examples, which inject small-magnitude perturbations into inputs to test DNNs under extreme situations. While existing testing techniques prove to be effective, they mostly focus on generating digital adversarial perturbations (particularly for autonomous driving), e.g., changing image pixels, which may never happen in physical world. There is a critical missing piece in the literature on autonomous driving testing: understanding and exploiting both digital and physical adversarial perturbation generation for impacting steering decisions. In this paper, we present DeepBillboard, a systematic physical-world testing approach targeting at a common and practical driving scenario: drive-by billboards. DeepBillboard is capable of generating a robust and resilient printable adversarial billboard, which works under dynamic changing driving conditions including viewing angle, distance, and lighting. The objective is to maximize the possibility, degree, and duration of the steering-angle errors of an autonomous vehicle driving by the generated adversarial billboard. We have extensively evaluated the efficacy and robustness of DeepBillboard through conducting both digital and physical-world experiments. Results show that DeepBillboard is effective for various steering models and scenes. Furthermore, DeepBillboard is sufficiently robust and resilient for generating physical-world adversarial billboard tests for real-world driving under various weather conditions. To the best of our knowledge, this is the first study demonstrating the possibility of generating realistic and continuous physical-world tests for practical autonomous driving systems.

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Cross-layer Optimization for High Speed Adders: A Pareto Driven Machine Learning Approach

In spite of maturity to the modern electronic design automation (EDA) tools, optimized designs at architectural stage may become sub-optimal after going through physical design flow. Adder design has been such a long studied fundamental problem in VLSI industry yet designers cannot achieve optimal solutions by running EDA tools on the set of available prefix adder architectures. In this paper, we enhance a state-of-the-art prefix adder synthesis algorithm to obtain a much wider solution space in architectural domain. On top of that, a machine learning-based design space exploration methodology is applied to predict the Pareto frontier of the adders in physical domain, which is infeasible by exhaustively running EDA tools for innumerable architectural solutions. Considering the high cost of obtaining the true values for learning, an active learning algorithm is utilized to select the representative data during learning process, which uses less labeled data while achieving better quality of Pareto frontier. Experimental results demonstrate that our framework can achieve Pareto frontier of high quality over a wide design space, bridging the gap between architectural and physical designs.

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DAC-SDC Low Power Object Detection Challenge for UAV Applications

The 55th Design Automation Conference (DAC) held its first System Design Contest (SDC) in 2018. SDC'18 features a lower power object detection challenge (LPODC) on designing and implementing novel algorithms based object detection in images taken from unmanned aerial vehicles (UAV). The dataset includes 95 categories and 150k images, and the hardware platforms include Nvidia's TX2 and Xilinx's PYNQ Z1. DAC-SDC'18 attracted more than 110 entries from 12 countries. This paper presents in detail the dataset and evaluation procedure. It further discusses the methods developed by some of the entries as well as representative results. The paper concludes with directions for future improvements.

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Recent Advances in Convolutional Neural Network Acceleration

In recent years, convolutional neural networks (CNNs) have shown great performance in various fields such as image classification, pattern recognition, and multi-media compression. Two of the feature properties, local connectivity and weight sharing, can reduce the number of parameters and increase processing speed during training and inference. However, as the dimension of data becomes higher and the CNN architecture becomes more complicated, the end-to-end approach or the combined manner of CNN is computationally intensive, which becomes limitation to CNN's further implementation. Therefore, it is necessary and urgent to implement CNN in a faster way. In this paper, we first summarize the acceleration methods that contribute to but not limited to CNN by reviewing a broad variety of research papers. We propose a taxonomy in terms of three levels, i.e.~structure level, algorithm level, and implementation level, for acceleration methods. We also analyze the acceleration methods in terms of CNN architecture compression, algorithm optimization, and hardware-based improvement. At last, we give a discussion on different perspectives of these acceleration and optimization methods within each level. The discussion shows that the methods in each level still have large exploration space. By incorporating such a wide range of disciplines, we expect to provide a comprehensive reference for researchers who are interested in CNN acceleration.

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Bridging the Gap Between Layout Pattern Sampling and Hotspot Detection via Batch Active Learning

Layout hotpot detection is one of the main steps in modern VLSI design. A typical hotspot detection flow is extremely time consuming due to the computationally expensive mask optimization and lithographic simulation. Recent researches try to facilitate the procedure with a reduced flow including feature extraction, training set generation and hotspot detection, where feature extraction methods and hotspot detection engines are deeply studied. However, the performance of hotspot detectors relies highly on the quality of reference layout libraries which are costly to obtain and usually predetermined or randomly sampled in previous works. In this paper, we propose an active learning-based layout pattern sampling and hotspot detection flow, which simultaneously optimizes the machine learning model and the training set that aims to achieve similar or better hotspot detection performance with much smaller number of training instances. Experimental results show that our proposed method can significantly reduce lithography simulation overhead while attaining satisfactory detection accuracy on designs under both DUV and EUV lithography technologies.

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Adaptive 3D-IC TSV Fault Tolerance Structure Generation

In three dimensional integrated circuits (3D-ICs), through silicon via (TSV) is a critical technique in providing vertical connections. However, the yield and reliability is one of the key obstacles to adopt the TSV based 3D-ICs technology in industry. Various fault-tolerance structures using spare TSVs to repair faulty functional TSVs have been proposed in literature for yield and reliability enhancement, but a valid structure cannot always be found due to the lack of effective generation methods for fault-tolerance structures. In this paper, we focus on the problem of adaptive fault-tolerance structure generation. Given the relations between functional TSVs and spare TSVs, we first calculate the maximum number of tolerant faults in each TSV group. Then we propose an integer linear programming (ILP) based model to construct adaptive fault-tolerance struc- ture with minimal multiplexer delay overhead and hardware cost. We further develop a speed-up technique through efficient min-cost-max-flow (MCMF) model. All the proposed method- ologies are embedded in a top-down TSV planning framework to form functional TSV groups and generate adaptive fault- tolerance structures. Experimental results show that, compared with state-of-the-art, the number of spare TSVs used for fault tolerance can be effectively reduced.

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E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System

Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, industry has proposed character projection (CP) technique, where some complex shapes (characters) can be printed in one shot. Recently the traditional EBL system is extended into multi-column cell (MCC) system to further improve the throughput. In MCC system, several independent CPs are used to further speed-up the writing process. Because of the area constraint of stencil, MCC system needs to be packed/planned carefully to take advantage of the characters. In this paper, we prove that the overlapping aware stencil planning (OSP) problem is NP-hard. To solve OSP problem in MCC system, we present a tool, E-BLOW, with several novel speedup techniques, such as successive relaxation, dynamic programming, and KD-Tree based clustering. Experimental results show that, compared with previous works, E-BLOW demonstrates better performance for both conventional EBL system and MCC system.

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Triple Patterning Lithography (TPL) Layout Decomposition using End-Cutting (JM3 Special Session)

Triple patterning lithography (TPL) is one of the most promising techniques in the 14nm logic node and beyond. Conventional LELELE type TPL technology suffers from native conflict and overlapping problems. Recently, as an alternative process, triple patterning lithography with end cutting (LELE-EC) was proposed to overcome the limitations of LELELE manufacturing. In LELE-EC process the first two masks are LELE type double patterning, while the third mask is used to generate the end-cuts. Although the layout decomposition problem for LELELE has been well-studied in the literature, only few attempts have been made to address the LELE-EC layout decomposition problem. In this paper we propose the comprehensive study for LELE-EC layout decomposition. Conflict graph and end-cut graph are constructed to extract all the geometrical relationships of both input layout and end-cut candidates. Based on these graphs, integer linear programming (ILP) is formulated to minimize the conflict number and the stitch number. The experimental results demonstrate the effectiveness of the proposed algorithms.

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Layout Decomposition for Quadruple Patterning Lithography and Beyond

For next-generation technology nodes, multiple patterning lithography (MPL) has emerged as a key solution, e.g., triple patterning lithography (TPL) for 14/11nm, and quadruple patterning lithography (QPL) for sub-10nm. In this paper, we propose a generic and robust layout decomposition framework for QPL, which can be further extended to handle any general K-patterning lithography (K$>$4). Our framework is based on the semidefinite programming (SDP) formulation with novel coloring encoding. Meanwhile, we propose fast yet effective coloring assignment and achieve significant speedup. To our best knowledge, this is the first work on the general multiple patterning lithography layout decomposition.

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Lithography Hotspot Detection and Mitigation in Nanometer VLSI

With continued feature size scaling, even state of the art semiconductor manufacturing processes will often run into layouts with poor printability and yield. Identifying lithography hotspots is important at both physical verification and early physical design stages. While detailed lithography simulations can be very accurate, they may be too computationally expensive for full-chip scale and physical design inner loops. Meanwhile, pattern matching and machine learning based hotspot detection methods can provide acceptable quality and yet fast turn-around-time for full-chip scale physical verification and design. In this paper, we discuss some key issues and recent results on lithography hotspot detection and mitigation in nanometer VLSI.

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Voltage and Level-Shifter Assignment Driven Floorplanning

Low Power Design has become a significant requirement when the CMOS technology entered the nanometer era. Multiple-Supply Voltage (MSV) is a popular and effective method for both dynamic and static power reduction while maintaining performance. Level shifters may cause area and Interconnect Length Overhead (ILO), and should be considered at both floorplanning and post-floorplanning stages. In this paper, we propose a two phases algorithm framework, called VLSAF, to solve voltage and level shifter assignment problem. At floorplanning phase, we use a convex cost network flow algorithm to assign voltage and a minimum cost flow algorithm to handle level-shifter assignment. At post-floorplanning phase, a heuristic method is adopted to redistribute white spaces and calculate the positions and shapes of level shifters. The experimental results show VLSAF is effective.

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A High-Performance Triple Patterning Layout Decomposer with Balanced Density

Triple patterning lithography (TPL) has received more and more attentions from industry as one of the leading candidate for 14nm/11nm nodes. In this paper, we propose a high performance layout decomposer for TPL. Density balancing is seamlessly integrated into all key steps in our TPL layout decomposition, including density-balanced semi-definite programming (SDP), density-based mapping, and density-balanced graph simplification. Our new TPL decomposer can obtain high performance even compared to previous state-of-the-art layout decomposers which are not balanced-density aware, e.g., by Yu et al. (ICCAD'11), Fang et al. (DAC'12), and Kuang et al. (DAC'13). Furthermore, the balanced-density version of our decomposer can provide more balanced density which leads to less edge placement error (EPE), while the conflict and stitch numbers are still very comparable to our non-balanced-density baseline.

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Multi-Voltage and Level-Shifter Assignment Driven Floorplanning

As technology scales, low power design has become a significant requirement for SOC designers. Among the existing techniques, Multiple-Supply Voltage (MSV) is a popular and effective method to reduce both dynamic and static power. Besides, level shifters consume area and delay, and should be considered during floorplanning. In this paper, we present a new floorplanning system, called MVLSAF, to solve multi-voltage and level shifter assignment problem. We use a convex cost network flow algorithm to assign arbitrary number of legal working voltages and a minimum cost flow algorithm to handle level-shifter assignment. The experimental results show MVLSAF is effective.

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