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arXiv · 2201.10790

High-production-rate fabrication of low-loss lithium niobate electro-optic modulators using photolithography assisted chemo-mechanical etching (PLACE)

Rongbo Wu·Lang Gao·Youting Liang·Yong Zheng·Junxia Zhou·Hongxin Qi·Difeng Yin·Min Wang·Zhiwei Fang·Ya Cheng
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Abstract

Integrated thin-film lithium niobate (LN) electro-optic (EO) modulators of broad bandwidth, low insertion loss, low cost and high production rate are essential elements in contemporary inter-connection industries and disruptive applications. Here, we demonstrated the design and fabri-cation of a high performance thin-film LN EO modulator using photolithography assisted chemo-mechanical etching (PLACE) technology. Our device shows a 3-dB bandwidth over 50 GHz, along with a comparable low half wave voltage-length product of 2.16 Vcm. We obtain a fiber-to-fiber insertion loss of 2.6 dB.

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Rongbo Wu, Lang Gao, Youting Liang, Yong Zheng, Junxia Zhou, Hongxin Qi, Difeng Yin, Min Wang, Zhiwei Fang, Ya Cheng. 2022-01-26. High-production-rate fabrication of low-loss lithium niobate electro-optic modulators using photolithography assisted chemo-mechanical etching (PLACE). https://arxiv.org/abs/2201.10790

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