arXiv subjects

Botong Li

Publications and source records attributed to Botong Li.

14 recordsLinked to original sources

arXiv2026

Thermal Stability and Phase Transformation of Conductive $\alpha$-$(\mathrm{Al}_{x}\mathrm{Ga}_{1-x})_{2}\mathrm{O}_{3}/\mathrm{Ga}_{2}\mathrm{O}_{3}$ Heterostructures on Sapphire Substrates

Thermal stability and phase transformation of conductive $\alpha$-$(\mathrm{Al}_{0.16}\mathrm{Ga}_{0.84})_{2}\mathrm{O}_{3}/\mathrm{Ga}_{2}\mathrm{O}_{3}$ heterostructures on sapphire substrates were investigated using in situ high-temperature X-ray diffraction (HT-XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM). Conductive $\alpha$-$(\mathrm{Al}_{0.16}\mathrm{Ga}_{0.84})_{2}\mathrm{O}_{3}/\mathrm{Ga}_{2}\mathrm{O}_{3}$ heterostructures with fluorine (F) doping were grown by mist chemical vapor deposition on sapphire substrates, achieving a Hall mobility of $28~\mathrm{cm^{2}\,V^{-1}\,s^{-1}}$ and an electron concentration of $1.4\times10^{20}~\mathrm{cm^{-3}}$. The heterostructures exhibited thermal stability up to approximately $550$--$

cond-mat.mtrl-sci↗

arXiv2026

Crystallinity Evolution of MOCVD-Grown $\beta$-Ga$_2$O$_3$ Films Probed by In Situ HT-XRD under Different Reactor Heights

The crystallinity of $\beta$-Ga$_2$O$_3$ thin films grown by metal-organic chemical vapor deposition (MOCVD) is strongly influenced by reactor design and the resulting growth environment. In this work, we investigate the role of reactor height on the crystallinity evolution of MOCVD-grown $\beta$-Ga$_2$O$_3$ films by directly comparing long- and short-chamber showerhead configurations. Structural evolution was probed by in situ high-temperature X-ray diffraction (HT-XRD) as the MOCVD-grown films were heated from 25~$^\circ$C to 1100~$^\circ$C. Temperature-dependent XRD reveals a consistent redshift of the $\beta$-Ga$_2$O$_3$~($-201$) reflection after HT-XRD heating and subsequent cooling to room temperature for both reactor geometries, indicating a similar thermally driven strain response. Quantitative rocking-curve analysis shows a non-monotonic temperature dependence of the ($-201$) full width at half maximum (FWHM), with minimum values of approximately 2.03$^\circ$ and 2.72$^\circ$ for the short- and long-chamber films, respectively, reflecting differences in mosaic alignment established during growth. Atomic force microscopy further shows that short-chamber-grown films exhibit smoother surfaces, with root-mean-square roughness values of approximately 7.7~nm before and 7.3~nm after HT-XRD heating, compared to 19.3~nm and 12.3~nm, respectively, for long-chamber-grown films. Overall, these results indicate that reactor height influences the initial crystalline and morphological templates of $\beta$-Ga$_2$O$_3$ films and modulates their elevated-temperature structural response, providing practical insights for optimizing MOCVD reactor design for high-quality $\beta$-Ga$_2$O$_3$ growth.

cond-mat.mtrl-sci↗

arXiv2026

Dosimetry for Proton Therapy Using a \beta-Ga$_2$O$_3$ Metal-Semiconductor-Metal Detector with Low-Noise Amplification

Intensity-modulated proton therapy (IMPT) employs proton radiation rather than conventional X-rays to treat cancerous tumors. This approach offers significant advantages by minimizing the radiation exposure of surrounding healthy tissue, leading to improved patient outcomes and reduced side effects compared to traditional X-ray therapy. To ensure patient safety, each treatment plan must be experimentally validated before clinical implementation. However, current dosimetry devices face limitations in performing angled beam measurements and obtaining multi-depth assessments, both of which are essential for verifying IMPT treatment plans. In this study, the performance of a \beta-Ga$_2$O$_3$-based metal-semiconductor-metal (MSM) detector with a low-noise amplifier is studied and evaluated under various proton radiation doses and energy levels delivered by a MEVION S250i proton accelerator. The detector performance is also compared with that of an ionization chamber. The \beta-Ga$_2$O$_3$ detector exhibits a linear response with proton dose for single-spot irradiations, and its response to varying proton energies closely matches both the ion chamber data and simulated dose distributions. These findings highlight the potential of \beta-Ga$_2$O$_3$-based detectors as robust dosimetry devices for IMPT applications.

physics.med-ph↗

arXiv2025

In situ XRD Study of Strain Evolution in AlGaN/GaN HEMT at High Temperatures up to 1000 {\deg}C

The thermal stability and structural evolution of a GaN high-electron-mobility transistor (HEMT) heterostructure grown on a Si (111) substrate were investigated using in situ high-temperature X-ray diffraction (HT-XRD), reciprocal space mapping (RSM), Raman spectroscopy, and rocking-curve (RC) analysis at varying temperatures. The heterostructure, consisting of a p-GaN cap, an AlGaN barrier, and a GaN channel supported by two AlGaN/AlGaN superlattice (SL) buffer layers, maintained clear and periodic satellite peaks up to a temperature of 1000 deg C, confirming excellent structural integrity. Symmetric and asymmetric RSM results reveal that both the Si and GaN diffraction peaks shift to lower angles with increasing temperature, consistent with thermal expansion, and show no significant broadening or relaxation throughout the heating process. The c-lattice constant follows the theoretical expansion predicted by the multi-frequency Einstein model, whereas the a-lattice expansion is slower due to in-plane strain constraints imposed by the underlying Si substrate and buffer layers. Rapid lattice contraction during the fast-cooling stage induces a residual compressive strain of approximately 0.3 percent in the GaN channel after cooling. Raman spectra further confirm this strain state through a blue shift of approximately 1.5 cm-1 of the GaN E2 (high) phonon mode, corresponding to an in-plane strain of about 0.2 percent. Rocking-curve analysis reveals an increase in both screw and edge dislocation densities by 28 percent and 12 percent, respectively. These results collectively demonstrate that the GaN HEMT heterostructure exhibits robust crystalline stability up to 1000 deg C, with only minor strain redistribution and limited dislocation activity, providing experimental evidence for GaN device applications under high-temperature conditions.

cond-mat.mtrl-sci↗

arXiv2025

In situ Study of p-NiO Film Quality at High Temperatures up to 1100 deg C

NiO is a promising p-type material for photovoltaics and power electronics, but its temperature limits remain unclear. Using in situ high-temperature X-ray diffraction (HT-XRD) from 30 to 1100 C, we track the structural evolution of NiO thin films in air. The film crystallizes from an amorphous phase to cubic NiO between 300 and 400 C, where the emergence and growth of the (111) diffraction peak correlate with an increase in electrical resistivity. Further increases in temperature lead to improved crystallinity and higher resistivity. At 1100 C, the formation of Ni2O3 is observed, resulting in a highly resistive film. This study establishes a clear correlation between phase evolution, crystallinity, and resistive behavior in NiO thin films.

cond-mat.mtrl-sci↗

arXiv2025

High thermal conductivity of rutile-GeO$_2$ films grown by MOCVD: $52.9~\mathrm{W\,m^{-1}\,K^{-1}}$

Rutile germanium dioxide (r-GeO2) has recently emerged as a promising ultrawide-bandgap (UWBG) semiconductor owing to its wide bandgap (~4.4-5.1 eV), ambipolar doping potential, and high theoretical thermal conductivity. However, experimental data on the thermal conductivity of r-GeO2 epitaxial layers have not been reported, primarily due to challenges in phase control and surface roughness. Here, we report a high thermal conductivity of 52.9 +/- 6.6 W m^-1 K^-1 for high-quality (002) r-GeO2 films grown by metal-organic chemical vapor deposition (MOCVD) and characterized using time-domain thermoreflectance (TDTR). The phase control was achieved through a seed-driven stepwise crystallization (SDSC) approach, and the surface roughness was significantly reduced from 76 nm to 16 nm (locally as low as 1 A) via chemical mechanical polishing (CMP). These results highlight the promise of r-GeO2 as a UWBG oxide platform for power electronics applications.

cond-mat.mtrl-sci↗

arXiv2025

$\beta$-Ga$_2$O$_3$--Based Radiation Detector for Proton Therapy

Intensity modulated proton therapy (IMPT) is an advanced cancer treatment modality that offers significant advantages over conventional X-ray therapies, particularly in its ability to minimize radiation dose beyond the tumor target. This reduction in unnecessary irradiation exposure significantly lowers the risk to surrounding healthy tissue and reduces side effects compared to conventional X-ray treatments. However, due to the high complexity of IMPT plans, each plan must be independently validated to ensure the safety and efficacy of the radiation exposure to the patient. While ion chambers are currently used for this purpose, their limitations-particularly in angled-beam measurements and multi-depth assessments-hinder their effectiveness. Silicon-based detectors, commonly used in X-ray therapy, are unsuitable for IMPT due to their rapid degradation under proton irradiation. In this study, a $\beta$-Ga$_2$O$_3$-based metal-semiconductor-metal (MSM) detector was evaluated and compared with a commercial ion chamber using a MEVION S250i proton accelerator. The $\beta$-Ga$_2$O$_3$ detector demonstrated reliable detection of single-pulse proton doses as low as 0.26 MU and exhibited a linear charge-to-dose relationship across a wide range of irradiation conditions. Furthermore, its measurement variability was comparable to that of the ion chamber, with improved sensitivity observed at higher bias voltages. These results highlight the strong potential of $\beta$-Ga$_2$O$_3$ as a radiation-hard detector material for accurate dose verification in IMPT.

physics.med-ph↗

arXiv2025

Study of Optical Properties of MOCVD-Grown Rutile GeO2 Films

Rutile germanium dioxide (r-GeO$_2$) is a promising ultra-wide bandgap (UWBG) semiconductor, offering a high theoretical Baliga figure of merit, potential for p-type doping, and favorable thermal and electrical properties. In this work, we present a comprehensive optical investigation of crystalline r-GeO$_2$ thin films grown on r-TiO$_2$ (001) substrates via metal-organic chemical vapor deposition (MOCVD). Cathodoluminescence (CL) spectroscopy reveals broad visible emissions with distinct peaks near 470~nm and 520~nm. CL mapping indicates enhanced emission intensity in regions with larger crystalline domains, highlighting the correlation between domain size and optical quality. X-ray photoelectron spectroscopy (XPS) confirms the presence of Ge$^{4+}$ oxidation state and provides a bandgap estimation of $\sim$4.75~eV based on valence band and secondary electron cutoff analysis. UV--Vis transmittance measurements show a sharp absorption edge near 250--260~nm, corresponding to an optical bandgap in the range of 4.81--5.0~eV. These findings offer valuable insights into the defect-related emission behavior and band-edge characteristics of r-GeO$_2$, reinforcing its potential for future applications in power electronics and deep-ultraviolet optoelectronic devices.

cond-mat.mtrl-sci↗

arXiv2025

Phase Competition and Rutile Phase Stabilization of Growing GeO2 Films by MOCVD

Rutile germanium dioxide (r-GeO2) is an ultra-wide bandgap semiconductor with potential for ambipolar doping, making it a promising candidate for next-generation power electronics and optoelectronics. Growth of phase-pure r-GeO2 films by vapor phase techniques like metalorganic chemical vapor deposition (MOCVD) is challenging because of polymorphic competition from amorphous and quartz GeO2. Here, we introduce seed-driven stepwise crystallization (SDSC) as a segmented growth strategy for obtaining r-GeO2 films on r-TiO2 (001) substrate. SDSC divides the growth into repeated cycles of film deposition and cooling-heating ramps, which suppress the non-rutile phases. We discuss the underlying mechanisms of phase selection during SDSC growth. We demonstrate continuous, phase-pure, partially epitaxial r-GeO2 (001) films exhibiting x-ray rocking curves with a FWHM of 597 arcsec. SDSC-based growth provides a generalizable pathway for selective vapor-phase growth of metastable or unstable phases, offering new opportunities for phase-selective thin-film engineering.

cond-mat.mtrl-sci↗

arXiv2025

Phase Evolution and Substrate-Dependent Nucleation of Quartz GeO$_2$ Films Grown by MOCVD on r- and c-Plane Sapphires

Ultrawide-bandgap (UWBG) semiconductors, such as GeO$_2$, are gaining significant attention for their potential in high-performance applications, particularly in piezoelectric devices. Despite extensive research, a comprehensive understanding of the growth dynamics and phase evolution of GeO$_2$ films via metal-organic chemical vapor deposition (MOCVD) remains insufficient. In this study, we investigate the growth behavior and morphological evolution of GeO$_2$ thin films on r-plane and c-plane sapphire substrates for the MOCVD growth process. The temporal evolution of crystallization and the amorphous-to-quartz phase transition are systematically elucidated for the first time. As growth time increases, the spherulitic quartz patterns expand in size, and elevated growth temperatures are found to enhance the crystallization rate. Distinct morphological symmetries emerge depending on the substrate orientation: quadrangular patterns on r-plane sapphire and hexagonal patterns on c-plane sapphire. Atomic force microscopy reveals that these spherulitic domains exhibit pyramid-like surface topography, consistent with volumetric contraction during the amorphous-to-quartz phase transition. These findings offer new insights into the phase evolution and substrate-dependent crystallization behavior of GeO$_2$ films grown by MOCVD.

cond-mat.mtrl-sci↗

arXiv2025

Carbon-Nanotube/$\beta$-Ga$_2$O$_3$ Heterojunction PIN Diodes

$\beta$-Ga$_2$O$_3$ is gaining attention as a promising semiconductor for next-generation high-power, high-efficiency, and high-temperature electronic devices, thanks to its exceptional material properties. However, challenges such as the lack of viable p-type doping have hindered its full potential, particularly in the development of ambipolar devices. This work introduces a novel heterojunction diode (HD) that combines p-type carbon nanotubes (CNTs) with i/n-type $\beta$-Ga$_2$O$_3$ to overcome these limitations. For the first time, a CNT/$\beta$-Ga$_2$O$_3$ hetero-p-n-junction diode is fabricated. Compared to a traditional Schottky barrier diode (SBD) with the same $\beta$-Ga$_2$O$_3$ epilayer, the CNT/$\beta$-Ga$_2$O$_3$ HD demonstrates significant improvements, including a higher rectifying ratio ($1.2 \times 10^{11}$), a larger turn-on voltage (1.96 V), a drastically reduced leakage current at temperatures up to 300 {\deg}C, and a 26.7% increase in breakdown voltage. Notably, the CNT/$\beta$-Ga$_2$O$_3$ HD exhibits a low ideality factor of 1.02, signifying an ideal interface between the materials. These results underline the potential of CNT/$\beta$-Ga$_2$O$_3$ heterojunctions for electronic applications, offering a promising solution to current limitations in $\beta$-Ga$_2$O$_3$-based devices.

physics.app-ph↗

arXiv2025

Degradation of 2.4-kV $Ga_{2}O_{3}$ Schottky Barrier Diode at High Temperatures up to 500 {\deg}C

Ga2O3 Schottky barrier diodes featuring a field plate and a composite SiO2/SiNx dielectric layer beneath the field plate were fabricated, achieving a breakdown voltage of 2.4 kV at room temperature. Electrical performance and degradation were analyzed via I-V and C-V measurements from 25 {\deg}C to 500 {\deg}C, revealing temperature-dependent transport, interface stability, and device stability. Upon returning to room temperature, the diodes exhibited nearly unchanged forward characteristics, while the breakdown voltage declined significantly from 2.4 kV to 700 V. This behavior indicates a temperature-induced reduction in the barrier height. Detailed analysis revealed that variable range hopping (VRH) dominated the leakage mechanism at moderate temperatures, while thermal emission (TE) became increasingly significant at temperatures exceeding 400 {\deg}C.

cond-mat.mtrl-sci↗

arXiv2024

Seed-Driven Stepwise Crystallization (SDSC) for Growing Rutile GeO2 Films via MOCVD

Germanium dioxide (r-GeO2) is an emerging new ultrawide bandgap (UWBG) semiconductor with significant potential for power electronics, thanks to its large-size substrate compatibility and ambipolar doping capability. However, phase segregation during metal-organic chemical vapor deposition (MOCVD) on substrates like r-TiO2 has posed a significant barrier to achieving high-quality films. Conventional optimization of growth parameters has been found so far not very insufficient in film coverage and film quality. To address this, a seed-driven stepwise crystallization (SDSC) growth approach was employed in this study, featuring multiple sequential deposition steps on a pre-templated substrate enriched with r-GeO2 seeds. The process began with an initial 180-minute deposition to establish r-GeO2 nucleation seeds, followed by a sequence of shorter deposition steps (90, 60, 60, 60, 60, and 60 minutes). This stepwise growth strategy progressively increased the crystalline coverage to 57.4%, 77.49%, 79.73%, 93.27%, 99.17%, and ultimately 100%. Concurrently, the crystalline quality improved substantially, evidenced by a ~30% reduction in the Full Width at Half Maximum (FWHM) of X-ray diffraction rocking curves. These findings demonstrate the potential of the SDSC approach for overcoming phase segregation and achieving high-quality, large-area r-GeO2 films.

cond-mat.mtrl-sci↗

arXiv2024

A TEM Study of MOCVD-Grown Rutile GeO2 Films

Ultrawide bandgap (UWBG) semiconductors are promising for next-generation power electronics, largely attributed to their substantial bandgap and exceptional breakdown electric field. Rutile GeO2 (r-GeO2) emerges as a promising alternative, particularly because of its ambipolar dopability. However, research on r-GeO2 is still in its infancy, and further investigation into its structural properties is essential for enhancing epilayer quality. In our previous work, we identified distinct surface morphologies; square-patterned and smooth regions of epitaxial r-GeO2 films grown on r-TiO2 (001) substrates using metal-organic chemical vapor deposition (MOCVD).This research employs transmission electron microscopy (TEM) to investigate the structural characteristics of the material. The findings indicate that the square-patterned regions are crystalline, whereas the smooth regions exhibit amorphous properties. The measured lattice spacing in the (110) plane is 0.324 nm, slightly exceeding the theoretical value of 0.312 nm. This discrepancy suggests the presence of tensile strain in the r-GeO2 film, resulting from lattice mismatch or thermal expansion differences with the substrate. We also observed a threading dislocation density of 1.83*10^9 cm-2, consisting of 11.76% screw-type, 29.41% edge-type, 55.89% mixed-type dislocations, and 2.94% planar defects. These findings offer valuable insights into the growth mechanisms and defect characteristics of r-GeO2.

cond-mat.mtrl-sci↗