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Performance Analysis of a Ge/Si Core/Shell Nanowire Field Effect Transistor

Gengchiau Liang·Jie Xiang·Neerav Kharche·Gerhard Klimeck·Charles M. Lieber·Mark Lundstrom
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Abstract

We analyze the performance of a recently reported Ge/Si core/shell nanowire transistor using a semiclassical, ballistic transport model and an sp3s*d5 tight-binding treatment of the electronic structure. Comparison of the measured performance of the device with the effects of series resistance removed to the simulated result assuming ballistic transport shows that the experimental device operates between 60 to 85% of the ballistic limit. For this ~15 nm diameter Ge nanowire, we also find that 14-18 modes are occupied at room temperature under ON-current conditions with ION/IOFF=100. To observe true one dimensional transport in a <110> Ge nanowire transistor, the nanowire diameter would have to be much less than about 5 nm. The methodology described here should prove useful for analyzing and comparing on common basis nanowire transistors of various materials and structures.

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Gengchiau Liang, Jie Xiang, Neerav Kharche, Gerhard Klimeck, Charles M. Lieber, Mark Lundstrom. 2006-11-08. Performance Analysis of a Ge/Si Core/Shell Nanowire Field Effect Transistor. https://doi.org/10.1021/nl062596f

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