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arXiv · 2504.15078

Scalable High-Precision Microfabrication on Various Lithography-Incompatible Substrates and Materials Enabled by Wafer-Scale Transfer Lithography of Commercial Photoresists

Qinhua Guo·Zhiqing Xu·Lizhou Yang·Jingyang Zhang·Yawen Gan·Jiajun Zhang·Jiahao Jiang·Yunda Wang
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Abstract

Photolithography conventionally requires flat, rigid and stable substrates, limiting its applications in flexible, curved, and transient electronics. In this study, a breakthrough approach is reported that employs a reversibly adhesion-switchable phase-changing polymer to universally transfer commercial photoresists onto previously inaccessible substrates, overcoming fundamental limitations of conventional photolithography.

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Qinhua Guo, Zhiqing Xu, Lizhou Yang, Jingyang Zhang, Yawen Gan, Jiajun Zhang, Jiahao Jiang, Yunda Wang. 2025-04-21. Scalable High-Precision Microfabrication on Various Lithography-Incompatible Substrates and Materials Enabled by Wafer-Scale Transfer Lithography of Commercial Photoresists. https://arxiv.org/abs/2504.15078

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