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arXiv · 2412.11413

Non-perturbative cathodoluminescence microscopy of beam-sensitive materials

Malcolm Bogroff·Gabriel Cowley·Ariel Nicastro·David Levy·Yueh-Chun Wu·Nannan Mao·Tilo H. Yang·Tianyi Zhang·Jing Kong·Rama Vasudevan·Kyle P. Kelley·Benjamin J. Lawrie
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Abstract

Cathodoluminescence microscopy is now a well-established and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electron-beam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials.

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Malcolm Bogroff, Gabriel Cowley, Ariel Nicastro, David Levy, Yueh-Chun Wu, Nannan Mao, Tilo H. Yang, Tianyi Zhang, Jing Kong, Rama Vasudevan, Kyle P. Kelley, Benjamin J. Lawrie. 2024-12-16. Non-perturbative cathodoluminescence microscopy of beam-sensitive materials. https://arxiv.org/abs/2412.11413

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