EXPLORE CONNECTIONS
Effect of Top Al$_2$O$_3$ Interlayer Thickness on Memory Window and Reliability of FeFETs With TiN/Al$_2$O$_3$/Hf$_{0.5}$Zr$_{0.5}$O$_2$/SiO$_x$/Si (MIFIS) Gate Structure
Follow the relationships that help you find your next source.
Connections are not prepared for this record yet, or its source metadata has changed. The original record remains available while background snapshots are rebuilt.