TY  - RPRT
TI  - FHiVI$^{2}$: A Fast High-Voltage approach for Ionisation Improvement in the context of plasma-assisted magnetron sputtering
AU  - R. Jean-Marie-Desiree
AU  - L. De Poucques
AU  - S. Cuynet
PY  - 2026
UR  - https://arxiv.org/abs/2610.12020
ID  - 2610.12020
ER  -