@misc{indiciae6f9aaaab11f0,
  title = {Photoresist-Free Lithography via Light-Induced Redox Patterning of Oxide Thin Films},
  author = {Johannes Frantti and Yukari Fujioka and Christopher Rouleau and Alexander Puretzky and Ilia Ivanov},
  year = {2026},
  url = {https://arxiv.org/abs/2609.22810},
  note = {Source identifier: 2609.22810}
}