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Yusi Chen

Publications and source records attributed to Yusi Chen.

2 recordsLinked to original sources

An Open-Source End-to-End FHE Implementation for Privacy-Preserving Llama 3 8B Inference

Cloud LLM services typically require users to send prompts to a model provider, creating a privacy risk. Fully homomorphic encryption (FHE) lets a server perform inference without decrypting the input, but representing data as ciphertexts adds storage and computational overhead. In CKKS-based LLM inference, the packing scheme maps logical tensors to ciphertexts and slots. It therefore determines the ciphertext count and the homomorphic cost of linear layers, and it constrains how data pass between linear layers, attention, and nonlinear computation. As models and sequences grow, inefficient layouts accumulate encoding, compute, and layout-conversion overhead. We present Odin, an FHE inference system that co-designs ciphertext packing and model execution for Llama. Starting from a THOR-style baseline whose bottleneck is weight encoding, Odin uses a feature-major cross-layer layout to unify residual connections and layer interfaces, and builds transient intra-operator layouts for linear projections and attention. This reduces redundant plaintext encoding of weights in wide projections. Within attention, QK^T produces scores that Softmax can consume directly, and PV consumes the resulting probabilities, avoiding intermediate repacking. For nonlinear ops, we use minimax polynomial approximation with input-range control and joint error allocation guided by model quality, reducing polynomial degree and multiplicative depth. To our knowledge, Odin is the first open-source end-to-end GPU CKKS implementation of Llama-3. With Llama-3-8B weights and a 128-token input, Odin evaluates all 32 Transformer layers on a single NVIDIA H100 80 GB GPU. Server-side end-to-end FHE evaluation takes 366.4 s and 58.9 GiB peak device memory. Under the same model, input, CKKS parameters, and hardware, THOR takes 1651.9 s, a 4.51x speedup.

cs.CR

Titanium dioxide hole-blocking layer in ultra-thin-film crystalline silicon solar cells

One of the remaining obstacles to approaching the theoretical efficiency limit of crystalline silicon (c-Si) solar cells is the exceedingly high interface recombination loss for minority carriers at the Ohmic contacts. In ultra-thin-film c-Si solar cells, this contact recombination loss is far more severe than for traditional thick cells due to the smaller volume and higher minority carrier concentration of the former. This paper presents a novel design of an electron passing (Ohmic) contact to n-type Si that is hole-blocking with significantly reduced hole recombination. This contact is formed by depositing a thin titanium dioxide (TiO2) layer to form a silicon metal-insulator-semiconductor (MIS) contact. A 2 μm thick Si cell with this TiO2 MIS contact achieved an open circuit voltage (Voc) of 645 mV, which is 10 mV higher than that of an ultra-thin cell with a metal contact. This MIS contact demonstrates a new path for ultra-thin-film c-Si solar cells to achieve high efficiencies as high as traditional thick cells, and enables the fabrication of high-efficiency c-Si solar cells at a lower cost.

physics.app-ph