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Thomas Hagger

Publications and source records attributed to Thomas Hagger.

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Unravelling the Role of Stacking Disorder on the Optoelectronic Properties of Zn3P2

Zinc phosphide (Zn3P2) is a promising photovoltaic absorber for thin-film and flexible solar cells due to its earth-abundant composition and favourable optoelectronic properties. Recent advances in epitaxy have enabled the growth of high-quality Zn3P2 thin films despite the challenges posed by its incompatible lattice parameter and thermal expansion coefficient. However, Zn3P2 remains prone to intrinsic extended defects, such as rotated domains, that can limit device performance. Here, using (scanning) transmission electron microscopy, we identify a previously unreported class of extended defects that appear as planar faults described by displacement vectors lying in the (001) plane. Within a pseudo-cubic description of Zn3P2, we establish a direct correspondence between planar faults and rotated domains, showing that both arise from the flexible ordering of vacant sites in the Zn sublattice. First-principles calculations reveal an extremely low planar-defect formation energy of 2.5 mJ m-2, demonstrating that these defects form at essentially negligible energetic cost, in excellent agreement with their high experimentally observed occurrence. Additional density functional theory (DFT) calculations show that intrinsic planar defects neither introduce mid-gap electronic states nor significantly perturb the local electrostatic potential, indicating that they are electronically benign. Instead, we propose that planar defects indirectly degrade device performance by acting as preferential segregation sites for optically active point defects.

cond-mat.mtrl-sci

Cathodoluminescence Analysis of Defects and Grain Boundaries in Zn3P2 Thin Films Grown on Graphene by MOVPE and MBE

Zn3P2 is a promising earth-abundant absorber for thin-film photovoltaics, yet its development is hindered by the lack of lattice-matched substrates, its incompatible thermal expansion coefficient, and a complex defect landscape. Here, we demonstrate the quasi-van der Waals epitaxy of Zn3P2 on graphene by metal-organic vapour phase epitaxy (MOVPE) and directly link the density of antiphase boundaries to optical emission modulation using correlative electron microscopy and cathodoluminescence (CL). Moreover, it is observed through CL that grain boundaries act as non-radiative sinks for excited charge carriers. The effect extends several micrometres into the grains, making grain boundaries detrimental to the applicability of Zn3P2 in read devices. Further comparison with molecular beam epitaxy grown films reveals the suppression of strain-related sub-bandgap emission in MOVPE-grown material. Overall, quasi-van der Waals epitaxy of Zn3P2 by MOVPE resulted in larger grains and improved material quality. In addition, these results directly link extended defects to recombination pathways in Zn3P2 and highlight grain-size control as a key strategy for improving earth-abundant photovoltaic absorbers.

cond-mat.mtrl-sci

Surfactant behavior and limited incorporation of Indium during in-situ doping of GeSn grown by MBE

GeSn is a promising group-IV semiconductor material for on-chip Si photonics devices and high-mobility transistors. These devices require the use of doped GeSn regions, achieved preferably in-situ during epitaxy. From the electronic valence point of view, p-type dopants of group-IV materials include B, Al, Ga and In. The latter element has never been investigated as p-type dopant in GeSn. In this work, we explore in-situ In p-type doping of GeSn grown by MBE. We demonstrate that In acts as a surfactant during epitaxial growth of GeSn:In, accumulating on surface and inducing segregation in the form of mobile Sn-In liquid droplets, strongly affecting the local composition of the material. In non-defective GeSn, we measure a maximal In incorporation of 2.8E18cm-3, which is two orders of magnitude lower than the values reported in the literature for in-situ p-type doping of GeSn. We further show that In induces the nucleation of defects at low growth temperatures, hindering out-of-equilibrium growth processes for maximization of dopant incorporation. This work provides insights on the limitations associated with in-situ In doping of GeSn, and discourages its utilization in GeSn-based optoelectronic devices.

cond-mat.mtrl-sci