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Neha Nooman

Publications and source records attributed to Neha Nooman.

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InGaAs and GaAsSb PIN Nanowire Arrays with Large Absorption around 1.55 μ m for Room Temperature Infrared Applications

We report a comparative analysis between InGaAs and GaAsSb-based top-down cylindrical nanowire arrays fabricated from p-i-n heterostructures. Optical constants measured via spectroscopic ellipsometry were incorporated into FDTD simulations to optimize array geometries. Simulations indicated that GaAsSb nanowire arrays with a diameter of 314 nm and a period of 904 nm achieved a peak absorption of 98% at 1550 nm, while InGaAs nanowire arrays with a 326 nm diameter and 1090 nm period reached 76%. Measurements of fabricated arrays showed absorption of 89% at 1628 nm (GaAsSb) and enhanced sub-bandgap absorption at 1766 nm (InGaAs) at room temperature. These results were confirmed through modelling of the as-fabricated nanowire diameters 330 nm and 411 nm, demonstrating excellent agreement between theory and experiment. In both material platforms, nano-structuring improved the absorption relative to planar films, demonstrating near-unity absorption suitable for practical single-photon detection.

physics.optics

Lateral diffusion in 2-micron InGaAs/GaAsSb superlattice planar diodes using atomic layer deposition of ZnO

Avalanche photodiodes used for greenhouse gas sensing often use a mesa-structure that suffers from high surface leakage currents and edge breakdown. In this paper, we report 2-micron InGaAs/GaAsSb superlattice (SL) based planar PIN diodes to eliminate the challenges posed by conventional mesa diodes. An alternate way to fabricate planar diodes using atomic layer deposited ZnO was explored and the effect of the diffusion process on the superlattice was studied using X-ray diffraction. The optimum diffusion conditions were then used to make planar PIN diodes. The diffused Zn concentration was measured to be approximately 1E20 cm-3 with a diffusion depth of 50 nm and a lateral diffusion ranging between 18 microns to 30 microns. A background doping of 5.8 x 1E14 cm-3 for the UID layer was determined by analyzing the capacitance-voltage measurements of the superlattice PIN diodes. The room temperature dark current for a device with a designed diameter of 30 microns is 1E-6 A at -2V. The quantum efficiency of the diode with a designed diameter of 200 microns was obtained to be 11.11% at 2-micron illumination. Further optimization of this diffusion process may lead to a rapid, manufacturable, and cost-effective method of developing planar diodes.

physics.app-ph