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MD Gius Uddin

Publications and source records attributed to MD Gius Uddin.

4 recordsLinked to original sources

Collective sliding relaxor ferroelectricity across thousand-layer van der Waals superstructures

Relaxor ferroelectrics are among the most important electromechanical materials owing to their exceptionally large electrostrictive responses. However, conventional relaxor behavior is generally associated with chemical complexity and structural disorder, where local compositional fluctuations generate polar nanoregions, making the microscopic origin of this behavior difficult to control and engineer. Here we report sliding relaxor ferroelectricity (S-RFE), a previously unknown relaxor state in which engineered stacking-phase heterogeneity enables cooperative interlayer sliding to generate collective relaxor behavior. Through stacking-phase engineering in rhombohedral boron nitride, we create sliding domains that act as structural analogues of polar nanoregions and cooperatively align under an electric field through interlayer sliding. This collective state produces reversible electromechanical deformation of up to approximately $-1.6\%$ with negligible hysteresis in approximately 300-nm-thick crystals, corresponding to approximately 1000 atomic layers. The resulting electrostriction coefficient ($Q_{33}$ of approximately $1200\,\mathrm{m}^{4}\mathrm{C}^{-2}$) exceeds those of most crystalline electrostrictors by orders of magnitude. Unlike conventional relaxors, whose electromechanical response is often suppressed by dipolar freezing at low temperatures, S-RFE remains active down to 1.6 K and maintains giant electromechanical functionality. Our results establish sliding relaxor ferroelectricity as a new route to relaxor behavior and reveal how atomic-scale interlayer motion can be amplified into collective mesoscale functionality across approximately one thousand layers, providing a materials-by-design platform for electromechanical, photonic, and quantum technologies based on van der Waals materials.

cond-mat.mtrl-sci↗

Topological-Insulator Heterophase Gate Stacks for Transistor Electrostatics

Conventional gate-stack scaling reduces dielectric thickness and increases permittivity while largely treating the position and electronic character of the gate-side screening boundary as fixed. Here we show that this boundary can be engineered by converting the surface of the topological insulator Bi\textsubscript{2}Se\textsubscript{3} into insulating high-$κ$ BiF\textsubscript{3}. Position-resolved calculations reveal a gap-opened immediate amorphous-BiF\textsubscript{3}/crystalline-Bi\textsubscript{2}Se\textsubscript{3} interface and a reconstructed gap-closed Bi\textsubscript{2}Se\textsubscript{3}-derived state in the adjacent subinterface layer, accompanied by a localized interfacial dipole. Capacitor measurements independently resolve a finite series response consistent with electronic compressibility at this boundary; this response lowers the nominal stack capacitance. Despite this capacitance penalty, MoS\textsubscript{2} transistors with closely matched BiF\textsubscript{3} thicknesses and a common BiF\textsubscript{3}/MoS\textsubscript{2} channel-side material interface exhibit near-thermionic-limit switching, negligible hysteresis and substantially weaker subthreshold drain-bias dependence than BiF\textsubscript{3}-only controls. These results identify the position and electronic character of the gate-side screening boundary as additional design variables for transistor electrostatics beyond nominal dielectric capacitance.

physics.app-ph↗

Photonics in Flatland: Challenges and Opportunities for Nanophotonics with 2D Semiconductors

Two-dimensional (2D) semiconductors are emerging as a versatile platform for nanophotonics, offering unprecedented tunability in optical properties through exciton resonance engineering, van der Waals heterostructuring, and external field control. These materials enable active optical modulation, single-photon emission, quantum photonics, and valleytronic functionalities, paving the way for next-generation optoelectronic and quantum photonic devices. However, key challenges remain in achieving large-area integration, maintaining excitonic coherence, and optimizing amplitude-phase modulation for efficient light manipulation. Advances in fabrication, strain engineering, and computational modelling will be crucial to overcoming these limitations. This perspective highlights recent progress in 2D semiconductor-based nanophotonics, emphasizing opportunities for scalable integration into photonics.

physics.optics↗

Broadband miniaturized spectrometers with a van der Waals tunnel diode

Miniaturized spectrometers are of immense interest for various on-chip and implantable photonic and optoelectronic applications. State-of-the-art conventional spectrometer designs rely heavily on bulky dispersive components (such as gratings, photodetector arrays, and interferometric optics) to capture different input spectral components that increase their integration complexity. Here, we report a high-performance broadband spectrometer based on a simple and compact van der Waals heterostructure diode, leveraging a careful selection of active van der Waals materials -- molybdenum disulfide and black phosphorus, their electrically tunable photoresponse, and advanced computational algorithms for spectral reconstruction. We achieve remarkably high peak wavelength accuracy of ~2 nanometers, and broad operation bandwidth spanning from ~500 to 1600 nanometers in a device with a ~30x20 μm2 footprint. This diode-based spectrometer scheme with broadband operation offers an attractive pathway for various applications, such as sensing, surveillance and spectral imaging.

physics.optics↗