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Hermann Kohlstedt

Publications and source records attributed to Hermann Kohlstedt.

17 recordsLinked to original sources

On the physical origins of switching diversity in Cu-embedded SiO$_x$ memristive devices

Resistive switching devices with sub-stoichiometric SiO$_x$ and pancake-like Cu nanoparticles (Cu-PCs) exhibit distinct macroscopic current-voltage characteristics classified as capacitive or gradual (interface-type switching) and abrupt or resistive (filamentary-type switching), motivating an analysis of the microscopic processes underlying this diversity. It is proposed that the device defect landscape is largely shaped by two charged defect types, mobile oxygen vacancies and immobile Cu-related defects, whose distributions jointly govern interfacial and bulk transport. An effective one-dimensional cloud-in-a-cell simulation framework is employed to reproduce the phenomenological picture of both interface-type and filamentary-type switching by incorporating the dominant coupled ionic and electronic processes underlying these mechanisms. The model includes oxygen-vacancy drift-diffusion, Schottky-limited injection at the metal/oxide interfaces, and bulk trap-assisted transport via Poole-Frenkel conduction, with Cu-PCs near the top interface treated effectively. A simulation-based parametric study varying voltage stress, sweep rate, and oxide thickness is used to examine how these factors rebalance voltage partitioning and the spatiotemporal electric field distribution, thereby altering vacancy redistribution and the relative contributions of interface- and bulk-limited conduction. Using representative, physically motivated parameter sets informed by prior device-level studies, the simulations accurately reproduce the characteristic $I$-$V$ signatures of seven different experimentally observed switching responses. Overall, the findings help to link microscopic defect landscapes and transport processes to experimentally measured macroscopic responses within a single, self-consistent modeling framework.

cond-mat.mtrl-sci

Wedge-type engineered analog SiO$_\mathrm{x}$/Cu/SiO$_\mathrm{x}$-Memristive Devices for Neuromorphic Applications

This study presents a comprehensive examination of the development of TiN/SiO$_\mathrm{x}$/Cu/SiO$_\mathrm{x}$/TiN memristive devices, engineered for neuromorphic applications using a wedge-type deposition technique and Monte Carlo simulations. Identifying critical parameters for the desired device characteristics can be challenging with conventional trial-and-error approaches, which often obscure the effects of varying layer compositions. By employing an \textit{off-center} thermal evaporation method, we created a thickness gradient of SiO$_\mathrm{x}$ and Cu on a 4-inch wafer, facilitating detailed resistance map analysis through semiautomatic measurements. This allows to investigate in detail the influence of layer composition and thickness on single wafers, thus keeping every other process condition constant. Combining experimental data with simulations provides a precise understanding of the layer thickness distribution and its impact on device performance. Optimizing the SiO$_\mathrm{x}$ layers to be below 12.5 nm, coupled with a discontinuous Cu layer with a nominal thickness lower than 0.6 nm, exhibits analog switching properties with an R$_\mathrm{on}$/R$_\mathrm{off}$ ratio of $>$100, suitable for neuromorphic applications, whereas R $\times$ A analysis shows no clear signs of filamentary switching. Our findings highlight the significant role of carefully choosing the SiO$_\mathrm{x}$ and Cu thickness in determining the switching behavior and provide insights that could lead to the more systematic development of high-performance analog switching components for bio-inspired computing systems.

cond-mat.mes-hall

Demonstration and STEM Analysis of Ferroelectric Switching in MOCVD-Grown Single Crystalline Al$_{0.85}$Sc$_{0.15}$N

Wurtzite-type Al$_{1-x}$Sc$_x$N solid solutions grown by metal organic chemical vapour deposition are for the first time confirmed to be ferroelectric. The film with 230 nm thickness and x = 0.15 exhibits a coercive field of 5.5 MV/cm at a measurement frequency of 1.5 kHz. Single crystal quality and homogeneous chemical composition of the film was confirmed by X-ray diffraction spectroscopic methods such as time of flight secondary ion mass spectrometry. Annular bright field scanning transmission electron microscopy served to proof the ferroelectric polarization inversion on unit cell level. The single crystal quality further allowed to image the large-scale domain pattern of a wurtzite-type ferroelectric for the first time, revealing a predominantly cone-like domain shape along the c-axis of the material. As in previous work, this again implies the presence of strong polarization discontinuities along this crystallographic axis, which could be suitable for current transport. The domains are separated by narrow domain walls, for which an upper thickness limit of 3 nm was deduced, but which could potentially be atomically sharp. We are confident that these results will advance the commencing integration of wurtzite-type ferroelectrics to GaN as well as generally III-N based heterostructures and devices.

physics.app-ph

In-Grain Ferroelectric Switching in Sub-5 nm Thin AlScN Films at 1 V

Analog switching in ferroelectric devices promises neuromorphic computing with highest energy efficiency, if limited device scalability can be overcome. To contribute to a solution, we report on the ferroelectric switching characteristics of sub-5 nm thin Al$_{0.74}$Sc$_{0.26}$N films grown on Pt/Ti/SiO2/Si and epitaxial Pt/GaN/sapphire templates by sputter-deposition. In this context, we focus on the following major achievements compared to previously available wurtzite-type ferroelectrics: 1) Record low switching voltages down to 1 V are achieved, which is in a range that can be supplied by standard on-chip voltage sources. 2) Compared to the previously investigated deposition of thinnest Al$_{1-x}$Sc$_x$N films on epitaxial templates, a significantly larger coercive field to breakdown field ratio is observed for Al$_{0.74}$Sc$_{0.26}$N films grown on silicon substrates, the technologically most relevant substrate-type. 3) The formation of true ferroelectric domains in wurtzite-type materials is for the first time demonstrated on the atomic scale by scanning transmission electron microscopy investigations of a sub-5 nm thin partially switched film. The direct observation of inversion domain boundaries within single nm-sized grains supports the theory of a gradual domain-wall motion limited switching process in wurtzite-type ferroelectrics. Ultimately, this should enable the analog switching necessary for mimicking neuromorphic concepts also in highly scaled devices.

cond-mat.mtrl-sci

Ultrathin AlScN for low-voltage driven ferroelectric-based devices

Thickness scaling of ferroelectricity in AlScN is a determining factor for its potential application in neuromorphic computing and memory devices. In this letter, we report on ultrathin (10 nm) Al0.72Sc0.28N films that are ferroelectrically switchable at room temperature. All-epitaxial Al0.72Sc0.28N/Pt heterostructures are grown by magnetron sputtering onto GaN/sapphire substrates followed by an in situ Pt capping approach to avoid oxidation of the Al0.72Sc0.28N film surface. Structural characterization by X-ray diffraction and transmission electron microscopy reveals the established epitaxy. The thus obtained high-quality interfaces in combination with the in situ capping is expected to facilitate ferroelectric switching of AlScN in the ultrathin regime. The analysis of the relative permittivity and coercive field dependence on the Al0.72Sc0.28N film thicknesses in the range of 100 nm down to 10 nm indicates only moderate scaling effects, suggesting that the critical thickness for ferroelectricity is not yet approached. Furthermore, the deposited layer stack demonstrates the possibility of including ultrathin ferroelectric AlScN into all-epitaxial GaN-based devices using sputter deposition techniques. Thus, our work highlights the integration and scaling potential of all-epitaxial ultrathin AlScN offering high storage density paired with low voltage operation desired for state of the art ferroelectric memory devices.

physics.app-ph

Matter & Mind Matter

As a result of a hundred million years of evolution, living animals have adapted extremely well to their ecological niche. Such adaptation implies species-specific interactions with their immediate environment by processing sensory cues and responding with appropriate behavior. Understanding how living creatures perform pattern recognition and cognitive tasks is of particular importance for computing architectures: by studying these information pathways refined over eons of evolution, researchers may be able to streamline the process of developing more highly advanced, energy efficient autonomous systems. With the advent of novel electronic and ionic components along with a deeper understanding of information pathways in living species, a plethora of opportunities to develop completely novel information processing avenues are within reach. Here, we describe the basal information pathways in nervous systems, from the local neuron level to the entire nervous system network. The dual importance of local learning rules is addressed, from spike timing dependent plasticity at the neuron level to the interwoven morphological and dynamical mechanisms of the global network. Basal biological principles are highlighted, including phylogenies, ontogenesis, and homeostasis, with particular emphasis on network topology and dynamics. While in machine learning system training is performed on virgin networks without any a priori knowledge, the approach proposed here distinguishes itself unambiguously by employing growth mechanisms as a guideline to design novel computing architectures. Including fundamental biological information pathways that explore the spatiotemporal fundamentals of nervous systems has untapped potential for the development of entirely novel information processing systems. Finally, a benchmark for neuromorphic systems is suggested.

cond-mat.dis-nn

Stochastic behaviour of an interface-based memristive device

A large number of simulation models have been proposed over the years to mimic the electrical behaviour of memristive devices. The models are based either on sophisticated mathematical formulations that do not account for physical and chemical processes responsible for the actual switching dynamics or on multi-physical spatially resolved approaches that include the inherent stochastic behaviour of real-world memristive devices but are computationally very expensive. In contrast to the available models, we present a computationally inexpensive and robust spatially 1D model for simulating interface-type memristive devices. The model efficiently incorporates the stochastic behaviour observed in experiments and can be easily transferred to circuit simulation frameworks. The ion transport, responsible for the resistive switching behaviour, is modelled using the kinetic Cloud-In-a-Cell scheme. The calculated current-voltage characteristics obtained using the proposed model show excellent agreement with the experimental findings.

cs.ET

On the exceptional temperature stability of ferroelectric AlScN thin films

Through its dependence on low symmetry crystal phases, ferroelectricity is inherently a property tied to the lower temperature ranges of the phase diagram for a given material. This paper presents conclusive evidence that in the case of ferroelectric AlScN, low temperature has to be seen as a purely relative term, since its ferroelectric-to-paraelectric transition temperature is confirmed to surpass 1100°C and thus the transition temperature of virtually any other thin film ferroelectric. We arrived at this conclusion through investigating the structural stability of 0.4 - 2 $μ$m thick Al$_{0.73}$Sc$_{0.27}$N films grown on Mo bottom electrodes via in situ high-temperature X-ray diffraction and permittivity measurements. Our studies reveal the wurtzite-type structure of Al$_{0.73}$Sc$_{0.27}$N is conserved during the entire 1100°C annealing cycle, apparent through a constant c over a lattice parameter ratio. In situ permittivity measurements performed up to 1000°C strongly support this conclusion and include what could be the onset of a diverging permittivity only at the very upper end of the measurement interval. Our in situ measurements are well-supported by ex situ (scanning) transmission electron microscopy and polarization and capacity hysteresis measurements. These results confirm the structural stability on the sub-$μ$m scale next to the stability of the inscribed polarization during the complete 1100°C annealing treatment. Thus, AlScN is the first readily available thin film ferroelectric with a temperature stability that surpasses virtually all thermal budgets occurring in microtechnology, be it during fabrication or the lifetime of a device - even in harshest environments.

cond-mat.mtrl-sci

Ferroelectricity in AlScN: Switching, Imprint and sub-150 nm Films

The discovery of ferroelectricity in AlScN allowed the first clear observation of the effect in the wurtzite crystal structure, resulting in a material with a previously unprecedented combination of very large coercive fields (2-5 MV/cm) and remnant polarizations (70-110 $μ$C/cm$^2$). We obtained initial insight into the switching dynamics of AlScN, which suggests a domain wall motion limited process progressing from the electrode interfaces. Further, imprint was generally observed in AlScN films and can tentatively be traced to the alignment of charged defects with the internal and external polarization and field, respectively. Potentially crucial from the application point of view, ferroelectricity could be observed in films with thicknesses below 30 nm - as the coercive fields of AlScN were found to be largely independent of thickness between 600 nm and 27 nm.

cond-mat.mtrl-sci

Bifurcation without parameters in a chaotic system with a memristive element

We investigate the effect of memory on a chaotic system experimentally and theoretically. For this purpose, we use Chua's oscillator as an electrical model system showing chaotic dynamics extended by a memory element in form of a double-barrier memristive device. The device consists of Au/NbO$_\text{x}$/Al$_\text{2}$O$_\text{3}$/Al/Nb layers and exhibits strong analog-type resistive changes depending on the history of the charge flow. In the extended system strong changes in the dynamics of chaotic oscillations are observable. The otherwise fluctuating amplitudes of the Chua system are disrupted by transient silent states. After developing a model for Chua's oscillator with a memristive device, the numerical treatment reveals the underling dynamics as driven by the slow-fast dynamics of the memory element. Furthermore, the stabilizing and destabilizing dynamic bifurcations are identified that are passed by the system during its chaotic behavior.

nlin.CD

Anticipation of digital patterns

A memristive device is a novel passive device, which is essentially a resistor with memory. This device can be utilized for novel technical applications like neuromorphic computation. In this paper, we focus on anticipation - a capability of a system to decide how to react in an environment by predicting future states. Especially, we have designed an elementary memristive circuit for the anticipation of digital patterns, where this circuit is based on the capability of an amoeba to anticipate periodically occurring unipolar pulses. The resulting circuit has been verified by digital simulations and has been realized in hardware as well. For the practical realization, we have used an Ag-doped TiO2-x-based memristive device, which has been fabricated in planar capacitor structures on a silicon wafer. The functionality of the circuit is shown by simulations and measurements. Finally, the anticipation of information is demonstrated by using images, where the robustness of this anticipatory circuit against noise and faulty intermediate information is visualized.

cs.ET

In depth nano spectroscopic analysis on homogeneously switching double barrier memristive devices

Memristors based on a double barrier design have been analysed by various nano spectroscopic methods to unveil details about its microstructure and conduction mechanism. The device consists of an AlOx tunnel barrier and a NbOy/Au Schottky barrier sandwiched between Nb bottom electrode and Au top electrode. As it was anticipated that the local chemical composition of the tunnel barrier, i.e. oxidation state of the metals as well as concentration and distribution of oxygen ions, have a major influence on electronic conduction, these factors were carefully analysed. A combined approach was chosen in order to reliably investigate electronic states of Nb and O by electron energy-loss spectroscopy as well as map elements whose transition edges exhibit a different energy range by energy-dispersive X-ray spectroscopy like Au and Al. The results conclusively demonstrate significant oxidation of the bottom electrode as well as a small oxygen vacancy concentration in the Al oxide tunnel barrier. Possible scenarios to explain this unexpected additional oxide layer are discussed and kinetic Monte Carlo simulations were applied in order to identify its influence on conduction mechanisms in the device. In light of the strong deviations between observed and originally sought layout, this study highlights the robustness in terms of structural deviations of the double barrier memristor device.

cond-mat.mtrl-sci

An Enhanced Lumped Element Electrical Model of a Double Barrier Memristive Device

The massive parallel approach of neuromorphic circuits leads to effective methods for solving complex problems. It has turned out that resistive switching devices with a continuous resistance range are potential candidates for such applications. These devices are memristive systems - nonlinear resistors with memory. They are fabricated in nanotechnology and hence parameter spread during fabrication may aggravate reproducible analyses. This issue makes simulation models of memristive devices worthwhile. Kinetic Monte-Carlo simulations based on a distributed model of the device can be used to understand the underlying physical and chemical phenomena. However, such simulations are very time-consuming and neither convenient for investigations of whole circuits nor for real-time applications, e.g. emulation purposes. Instead, a concentrated model of the device can be used for both fast simulations and real-time applications, respectively. We introduce an enhanced electrical model of a valence change mechanism (VCM) based double barrier memristive device (DBMD) with a continuous resistance range. This device consists of an ultra-thin memristive layer sandwiched between a tunnel barrier and a Schottky-contact. The introduced model leads to very fast simulations by using usual circuit simulation tools while maintaining physically meaningful parameters. Kinetic Monte-Carlo simulations based on a distributed model and experimental data have been utilized as references to verify the concentrated model.

cs.ET

The role of ion transport phenomena in memristive double barrier devices

In this work we report on the role of ion transport for the dynamic behavior of a double barrier quantum mechanical Al/Al$_2$O$_3$/Nb$_{\text{x}}$O$_{\text{y}}$/Au memristive device based on numerical simulations in conjunction with experimental measurements. The device consists of an ultra-thin Nb$_{\text{x}}$O$_{\text{y}}$ solid state electrolyte between an Al$_2$O$_3$ tunnel barrier and a semiconductor metal interface at an Au electrode. It is shown that the device provides a number of interesting features for potential applications such as an intrinsic current compliance, a relatively long retention time, and no need for an initialization step. Therefore, it is particularly attractive for applications in highly dense random access memories or neuromorphic mixed signal circuits. However, the underlying physical mechanisms of the resistive switching are still not completely understood yet. To investigate the interplay between the current transport mechanisms and the inner atomistic device structure a lumped element circuit model is consistently coupled with 3D kinetic Monte Carlo model for the ion transport. The simulation results indicate that the drift of charged point defects within the Nb$_{\text{x}}$O$_{\text{y}}$ is the key factor for the resistive switching behavior. It is shown in detail that the diffusion of oxygen modifies the local electronic interface states resulting in a change of the interface properties of the double barrier device.

cond-mat.mtrl-sci

Kinetic Simulation of Filament Growth Dynamics in Memristive Electrochemical Metallization Devices

In this work we report on kinetic Monte-Carlo calculations of resistive switching and the underlying growth dynamics of filaments in an electrochemical metallization device consisting of an Ag/TiO2/Pt sandwich-like thin film system. The developed model is not limited to i) fast time scale dynamics and ii) only one growth and dissolution cycle of metallic filaments. In particular, we present results from the simulation of consecutive cycles. We find that the numerical results are in excellent agreement with experimentally obtained data. Additionally, we observe an unexpected filament growth mode which is in contradiction to the widely acknowledged picture of filament growth, but consistent with recent experimental findings.

cond-mat.mtrl-sci

Pt/Ti/Al2O3/Al tunnel junctions showing electroforming-free bipolar resistive switching behavior

We investigated electroforming-free bipolar resistive switching behavior in Pt/Ti/Al2O3/Al tunnel junctions where the Al2O3 tunnel barrier was naturally formed on Al in air. Various compliance current values for the junction's set switching successfully lead to various resistance values in its low resistance state, suggesting the possibility for multi-level-operation. A mechanism for the bipolar switching is qualitatively discussed in terms of the modulation of the tunnel barrier by the reactive Ti layer on top of the barrier.

cond-mat.mtrl-sci

1-D Simulation of the Electron Density Distribution in a Novel Nonvolatile Resistive Random Access Memory Device

The operation of a novel nonvolatile memory device based on a conductive ferroelectric/non-ferroelectric thin film multilayer stack is simulated numerically. The simulation involves the self-consistent steady state solution of Poisson's equation and the transport equation for electrons assuming a Drift-Diffusion transport mechanism. Special emphasis is put on the screening of the spontaneous polarization by conduction electrons as a function of the applied voltage. Depending on the orientation of the polarization in the ferroelectric layer, a high and a low resistive state are found giving rise to a hysteretic I-V characteristic. The R_high to R_low ratio ranging from > 50% to several orders of magnitude is calculated as a function of the dopant content.

cond-mat.mtrl-sci