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Hao-Yu Lan

Publications and source records attributed to Hao-Yu Lan.

2 recordsLinked to original sources

Process-Technology Co-optimization for 2D-FETs

We present the first experimental machine learning (ML)-enabled Process-Technology Co-Optimization (PTCO) framework for optimizing 2D transition metal dichalcogenide (TMD) FET fabrication directly from statistically meaningful experimental data rather than pure simulation data. We first introduce a transition voltage metric, VTrans, to quantify the gate voltage required for off-to-on switching and reveal its direct correlation with subthreshold swing (SS), highlighting an overlooked switching characteristic that governs both off-state and on-state performance. By integrating automated metric extraction, multi-objective recipe ranking, and predictive modeling, our framework uncovers hidden process-performance correlations and predicts the performance of unexplored fabrication recipes from limited experimental data. Experimental validation shows close agreement with ML predictions, thus demonstrating the framework's ability to efficiently guide gate stack optimization through iterative experimental feedback.

cond-mat.mes-hall

Scaling Two-Dimensional Semiconductor Nanoribbons for High-Performance Electronics

As silicon transistors scale toward future technology nodes, three-dimensional architectures -- including gate-all-around (GAA) nanoribbon and complementary field-effect transistors (CFETs) -- require channel widths in the tens of nanometers to meet density targets. Monolayer transition metal dichalcogenides (TMDs), with their atomically thin bodies, are promising channel materials for these architectures, yet most TMD-based FETs remain limited to micrometer-scale widths. Here, we show that channel width scaling of monolayer MoS2 nanoribbon transistors not only preserves but also enhances device performance. Reducing the channel width from hundreds of nanometers to $\sim$30--40 nm increases the median on-current density by $\sim$42% and reduces the median subthreshold swing by $\sim$16%, with a champion device reaching 995 $\mu$A $\mu$m$^{-1}$ at a drain-to-source voltage of 1 V and an overdrive voltage of 2.5 V. We attribute these improvements to three mechanisms: minimal edge-induced disorder, enhanced gate electrostatics at ribbon edges, and more efficient side-contact injection, together reducing contact resistance from $\sim$860 $\Omega$ $\mu$m to $\sim$270 $\Omega$ $\mu$m. Extending the platform to n-type WS2 and p-type WSe2 FETs, we achieve WSe2 p-FET on-currents of 357 $\mu$A $\mu$m$^{-1}$. These findings suggest that monolayer TMD nanoribbon FETs are promising candidates for future ultra-scaled electronics.

cond-mat.mtrl-sci