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Gaurav Thareja

Publications and source records attributed to Gaurav Thareja.

2 recordsLinked to original sources

Process-Technology Co-optimization for 2D-FETs

We present the first experimental machine learning (ML)-enabled Process-Technology Co-Optimization (PTCO) framework for optimizing 2D transition metal dichalcogenide (TMD) FET fabrication directly from statistically meaningful experimental data rather than pure simulation data. We first introduce a transition voltage metric, VTrans, to quantify the gate voltage required for off-to-on switching and reveal its direct correlation with subthreshold swing (SS), highlighting an overlooked switching characteristic that governs both off-state and on-state performance. By integrating automated metric extraction, multi-objective recipe ranking, and predictive modeling, our framework uncovers hidden process-performance correlations and predicts the performance of unexplored fabrication recipes from limited experimental data. Experimental validation shows close agreement with ML predictions, thus demonstrating the framework's ability to efficiently guide gate stack optimization through iterative experimental feedback.

cond-mat.mes-hall

ALD W-Doped SnO$_2$ TFTs for Indium-Free BEOL Electronics

This work reports back-end-of-line (BEOL) compatible, thin-film transistors (TFTs) with sub-10 nm tungsten-doped tin oxide (TWO) channels deposited by atomic layer deposition (ALD) at 150 $^\circ$C. TFTs with undoped SnO$_{\mathrm{x}}$, undoped WO$_{\mathrm{x}}$, and W-doped SnO$_{\mathrm{x}}$ channels with W concentrations of 5% and 10% were investigated. TFT with 10% W doping exhibited the best electrostatic control and overall device performance. Post-fabrication O$_{\mathrm{2}}$ annealing at 300 $^\circ$C for 5 minutes significantly enhanced device characteristics, reducing the subthreshold swing (SS) by nearly 2$\times$, increasing the I$_{\mathrm{on}}$/I$_{\mathrm{off}}$ ratio from $10^7$ to $10^9$, decreasing hysteresis by nearly 3$\times$ and positive bias stress-induced threshold shift by over 2$\times$ to a low value of 93 mV at a stress field of 4 MV/cm. Kinetic Monte Carlo simulations using Ginestra$^{\mathrm{TM}}$ support the experimental observations and attribute the bias instability to charge trapping in the gate dielectric and at the interface. This work demonstrates low-temperature ALD-grown TWO TFTs as a promising indium-free platform for BEOL and monolithic 3D integration.

physics.app-ph