arXiv subjects
Publications and source records attributed to David Esseni.
We present a fabricated and experimentally characterized memory stack that unifies memristive and memcapacitive behavior. Exploiting this dual functionality, we design a circuit enabling simultaneous control of spatial and temporal dynamics in recurrent spiking neural networks (RSNNs). Hardware-aware simulations highlight its promise for efficient neuromorphic processing.
This paper provides a brief introduction to the phenomenological aspects of the polarization in ferrroelectric materials, and then an analysis of a few selected topics related to the modelling of ferroelectrics. The description of ferroelectric-based devices is quite challenging, particularly because the ferroelectric is frequently stacked with other dielectrics or with a semiconductor, as opposed to being placed between metal electrodes. Predictive modelling of ferroelectric devices is admittedly difficult, and thus the scrutiny and calibration of the models by comparison to sound experimental data is of paramount importance.
This paper investigates and compares through a comprehensive TCAD analysis 2D and 3D simulations for ferroelectric based FETs. We provide clear evidence that the multiple read conductance values experimentally observed in FeFETs stem from source to drain percolation current paths, which are governed by the polarization patterns in the ferroelectric domains. Such a physical picture makes 3D simulations indispensable to capture even the qualitative features of the device behaviour, not to mention the quantitative aspects.
We present a study based on numerical simulations and comparative analysis of recent experimental data concerning the operation and design of FeFETs. Our results show that a proper consideration of charge trapping in the ferroelectric-dielectric stack is indispensable to reconcile simulations with experiments, and to attain the desired hysteretic behavior of the current-voltage characteristics. Then we analyze a few design options for polysilicon channel FeFETs and, in particular, we study the influence of the channel thickness and doping concentration on the memory window, and on the ratio between the polarization dependent, high and low resistance state.
An accurate estimate of the ferroelectric polarization in ferroelectric-dielectric stacks is important from a materials science perspective, and it is also crucial for the development of ferroelectric based electron devices. This paper revisits the theory and application of the PUND technique in Metal-Ferroelectric-Dielectric-Metal (MFDM) structures by using analytical derivations and numerical simulations. In an MFDM structure the results of the PUND technique may largely differ from the polarization actually switched in the stack, which in turn is different from the remnant polarization of the underlying ferroelectric. The main hindrances that prevent PUND measurements from providing a good estimate of the polarization switching in MFDM stacks are thus discussed. The inspection of the involved physical quantities, not always accessible in experiments, provides a useful insight about the main sources of the errors in the PUND technique, and clarifies the delicate interplay between the depolarization field and the charge injection and trapping in MFDM stacks with a thin dielectric layer.
We present an in-house modelling framework for Ferroelectric Tunnelling Junctions (FTJ), and an insightful study of the design of FTJs as synaptic devices. Results show that a moderately low-k tunnelling dielectric (e.g. SiO2) can increase the read current and the current dynamic range.
The technological exploitation of ferroelectricity in CMOS electron devices offers new design opportunities, but also significant challenges from an integration, optimization and modelling perspective. We here revisit the working principle and the modelling of some novel ferroelectric based devices, with an emphasis on energy efficiency and on applications to new computational paradigms.
The accurate extraction and the reliable, repeatable reduction of graphene - metal contact resistance (R$_{C}$) are still open issues in graphene technology. Here, we demonstrate the importance of following clear protocols when extracting R$_{C}$ using the transfer length method (TLM). We use the example of back-gated graphene TLM structures with nickel contacts, a complementary metal oxide semiconductor compatible metal. The accurate extraction of R$_{C}$ is significantly affected by generally observable Dirac voltage shifts with increasing channel lengths in ambient conditions. R$_{C}$ is generally a function of the carrier density in graphene. Hence, the position of the Fermi level and the gate voltage impact the extraction of R$_{C}$. Measurements in high vacuum, on the other hand, result in dependable extraction of R$_{C}$ as a function of gate voltage owing to minimal spread in Dirac voltages. We further assess the accurate measurement and extraction of important parameters like contact-end resistance, transfer length, sheet resistance of graphene under the metal contact and specific contact resistivity as a function of the back-gate voltage. The presented methodology has also been applied to devices with gold and copper contacts, with similar conclusions.
Graphene membranes act as highly sensitive transducers in nanoelectromechanical devices due to their ultimate thinness. Previously, the piezoresistive effect has been experimentally verified in graphene using uniaxial strain in graphene. Here we report experimental and theoretical data on the uni- and biaxial piezoresistive properties of suspended graphene membranes applied to piezoresistive pressure sensors. A detailed model that utilizes a linearized Boltzman transport equation describes accurately the charge carrier density and mobility in strained graphene, and hence the gauge factor. The gauge factor is found to be practically independent of the doping concentration and crystallographic orientation of the graphene films. These investigations provide deeper insight into the piezoresistive behavior of graphene membranes.
In this paper the effect of biaxial and uniaxial strain on the mobility of single-layer MoS$_{2}$ for temperatures T $>$ 100 K is investigated. Scattering from intrinsic phonon modes, remote phonon and charged impurities are considered along with static screening. Ab-initio simulations are utilized to investigate the strain induced effects on the electronic bandstructure and the linearized Boltzmann transport equation is used to evaluate the low-field mobility under various strain conditions. The results indicate that the mobility increases with tensile biaxial and tensile uniaxial strain along the armchair direction. Under compressive strain, however, the mobility exhibits a non-monotonic behavior when the strain magnitude is varied. In particular, with a relatively small compressive strain of 1% the mobility is reduced by about a factor of two compared to the unstrained condition, but with a larger compressive strain the mobility partly recovers such a degradation.
The single particle tunneling in a vertical stack consisting of monolayers of two-dimensional semiconductors is studied theoretically and its application to a novel Two-dimensional Heterojunction Interlayer Tunneling Field Effect Transistor (Thin-TFET) is proposed and described. The tunneling current is calculated by using a formalism based on the Bardeen's transfer Hamiltonian, and including a semi-classical treatment of scattering and energy broadening effects. The misalignment between the two 2D materials is also studied and found to influence the magnitude of the tunneling current, but have a modest impact on its gate voltage dependence. Our simulation results suggest that the Thin-TFETs can achieve very steep subthreshold swing, whose lower limit is ultimately set by the band tails in the energy gaps of the 2D materials produced by energy broadening. The Thin-TFET is thus very promising as a low voltage, low energy solid state electronic switch.