arXiv subjects

C. Toepffer

Publications and source records attributed to C. Toepffer.

2 recordsLinked to original sources

arXiv2010

Microfield Fluctuations and Spectral Line Shapes in Strongly Coupled Two-Component Plasmas

The spectral line shapes for hydrogen-like heavy ion emitters embedded in strongly correlated two-component electron-ion plasmas are investigated with numerical simulations. For that purpose the microfield fluctuations are calculated by molecular dynamics simulations where short range quantum effects are taken into account by using a regularized Coulomb potential for the electron-ion interaction. The microfield fluctuations are used as input in a numerical solution of the time-dependent Schroedinger equation for the radiating electron. In distinction to the standard impact and quasistatic approximations the method presented here allows to account for the correlations between plasma ions and electrons. The shapes of the Ly-alpha line in Al are investigated in the intermediate regime. The calculations are in good agreement with experiments on the Ly-alpha line in laser generated plasmas.

physics.plasm-ph↗

arXiv2005

Microfield distributions in strongly coupled two-component plasmas

The electric microfield distribution at charged particles is studied for two-component electron-ion plasmas using molecular dynamics simulation and theoretical models. The particles are treated within classical statistical mechanics using an electron-ion Coulomb potential regularized at distances less than the de Broglie length to take into account the quantum-diffraction effects. The potential-of-mean-force (PMF) approximation is deduced from a canonical ensemble formulation. The resulting probability density of the electric microfield satisfies exactly the second-moment sum rule without the use of adjustable parameters. The correlation functions between the charged radiator and the plasma ions and electrons are calculated using molecular dynamics simulations and the hypernetted-chain approximation for a two-component plasma. It is shown that the agreement between the theoretical models for the microfield distributions and the simulations is quite good in general.

physics.plasm-ph↗