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Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit"

Ole Steuernagel
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Abstract

Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" The effective absorption rates in quantum lithography are very low.

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Ole Steuernagel. 2003-05-08. Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit". https://arxiv.org/abs/quant-ph/0305042

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