Revealing epitaxial relationships at Ga$_2$O$_3$ interfaces with p-type oxides

Abstract

p-type oxide contact layers such as Cr$_2$O$_3$ and NiO are attracting increasing interest in pn-heterojunctions with n-type monoclinic $β$-Ga$_2$O$_3$ for high-power electronic devices and other extreme environment applications. However, scientific understanding of their epitaxial relationships remains incomplete. In this work we investigate the epitaxial relation of Cr$_2$O$_3$ and NiO layers to (001) and ($\bar{2}$01) out-of-plane oriented Ga$_2$O$_3$ substrates. Surprisingly, we find that, for the most commercially relevant (001)-orientation of the Ga$_2$O$_3$ substrate, the epitaxial relationships are Cr$_2$O$_3$ (0001) and NiO (111) $\parallel$ Ga$_2$O$_3$ (101), both at the non-intuitive $χ$ = 22.5 $^\circ$ angle with respect to the substrate normal. We explain this unusual discovery by the interfacial atomistic bonding dominated by oxygen sublattice equivalence of these Cr$_2$O$_3$ and NiO polar surface orientations to the tilted Ga$_2$O$_3$ (101), rather than Ga$_2$O$_3$ (001) substrate surface planes. Furthermore, we assign the in-plane orientation for Cr$_2$O$_3$ on ($\bar{2}$01)-oriented Ga$_2$O$_3$ as: Cr$_2$O$_3$ $[12\bar{3}0]$ $\parallel$ Ga$_2$O$_3$ $[010]$ with two in-plane rotational domains. Interface modeling confirms the in-plane orientation for Cr$_2$O$_3$/$(\bar{2}01)$ Ga$_2$O$_3$ and shows that strained O-terminated Ga$_2$O$_3$ $(\bar{2}01)$ surfaces have the lowest interfacial energy with Cr$_2$O$_3$ (0001). Beyond establishing the specific epitaxial relationships for Cr$_2$O$_3$ and NiO on Ga$_2$O$_3$, this work provides a systematic methodology for the unambiguous structural characterization of heterointerfaces involving materials with markedly different crystal symmetries.