Remote epitaxy beyond polarity

Ching-Tai Fu; Pei-Jan Hung; Xudong Li; Xiaolong Zhu; Yu Han; Sayantan Mahapatra; Zhiheng Zhao; Qingsong Fan; Xubing Wu; Qizhang Li; Chenxi Sui; Zirui Zhou; Ting-Hsuan Chen; Cheng-Hao Lei; Ivan Kuzmenko; Xiaobing Zuo; Byeongdu Lee; Alexander S. Filatov; Jeffrey R. Guest; Fengyuan Shi; Yuzi Liu; Hua Zhou; Yunfeng Shi; Po-Chun Hsu

arXiv · 2609.05365

Remote epitaxy beyond polarity

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Abstract

Remote epitaxy through a monolayer two-dimensional material-covered substrate establishes a crystallographic registry across the van der Waals (vdW) surface that enables the epitaxial growth, lift-off and transfer of single-crystalline films. A central belief in remote epitaxy is that the substrate facilitating the phenomenon must be a material with strong ionicity, as the interatomic electrostatic potential fluctuation in covalent and metallic materials is substantially attenuated by two-dimensional materials. Here, we show remote epitaxy is possible when the substrate is a metallic or covalently bonded material and experimentally demonstrate non-polar remote homo- and heteroepitaxy across a wide range of material systems, including both metals and semiconductors. The achieved non-polar remote interactions are designed and engineered by harnessing substrate conductivity and vicinal surface step-edge density. These findings indicate that remote epitaxy is universal and applicable to ionic, metallic, and covalent materials, expanding its capabilities and stimulating a plethora of new fundamental scientific questions about the mechanism of remote epitaxy.

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Ching-Tai Fu, Pei-Jan Hung, Xudong Li, Xiaolong Zhu, Yu Han, Sayantan Mahapatra, Zhiheng Zhao, Qingsong Fan, Xubing Wu, Qizhang Li, Chenxi Sui, Zirui Zhou, Ting-Hsuan Chen, Cheng-Hao Lei, Ivan Kuzmenko, Xiaobing Zuo, Byeongdu Lee, Alexander S. Filatov, Jeffrey R. Guest, Fengyuan Shi, Yuzi Liu, Hua Zhou, Yunfeng Shi, Po-Chun Hsu. 2026-09-04. Remote epitaxy beyond polarity. https://arxiv.org/abs/2609.05365

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