Mie-lithography: self-guiding nonlinear laser printing for deep ultraviolet to near-infrared nano dispersion devices

Abstract

Nanoscale control of optical dispersion is essential for applications ranging from miniaturized spectrometers to color printing, all of which demand broadband spectral tunability. However, the Kramers-Kronig relations impose a fundamental trade-off between dispersion and loss, strictly limiting the design ability of single-material devices across the deep ultraviolet (DUV) to near-infrared (NIR) regimes. Consequently, the fabrication of miniaturized dispersion devices heavily relies on costly nanofabrication or heterogeneous integration. Here we overcome these limitations by shifting the light-matter interaction from solid structure into air-filled voids. We introduce a fabrication strategy termed "Mie-lithography", in which laser printed seed nanocavities excite Mie resonances in air and the resulting localized field enhancement drives the self-assembly of three-dimensionally tunable void-type optical resonators. Because the resonant modes are primarily confined within air voids, this architecture effectively circumvents material-imposed dispersion-loss constraints, allowing on-demand customization of the broadband spectral response. This approach enables single-step, high-throughput (>= 10^6 pixels/s) printing of dispersion units with a resolution of 63,500 DPI. As a proof of concept, we demonstrate a DUV-NIR nano spectrometer integrated in a single material covering an unprecedented range from 200 nm to 800 nm. Our approach can be extended into a platform for ultra-broadband nano devices fabrication and design, opening avenues for high-pixel-density displays and miniaturized spectrometers.