arXiv · 2511.16165
Ultrafast {\mu}eV-Precision Bandgap Engineering in Low-Dimensional Topological Insulators
Abstract
Precise and ultrafast control of electronic band structures is a central challenge for advancing quantum functional materials and devices. Conventional approaches--such as chemical doping, lattice strain, or external gating--offer robust stability but remain confined to the quasi-static regime, far from the intrinsic femto- to picosecond dynamics that govern many-body interactions. Here, using cryogenic transient reflectance spectroscopy, we realize dynamic bandgap engineering in the anisotropic topological insulator $\alpha$-Bi$_4$Br$_4$ with unprecedented micro-electron-volt ($\mu$eV) precision. The exceptional sensitivity arises from the cooperative action of long-lived topological carriers, stabilized by restricted bulk-to-edge scattering phase space, together with symmetry-resolved coherent phonons that modulate inter-chain hopping. These channels jointly modify Coulomb screening and interband transitions, enabling both gradual and oscillatory control of the electronic structure. Supported by first-principles and tight-binding theory, we further demonstrate a dual-pump coherent control strategy for continuous, mode-selective tuning of electronic energies with $\mu$eV accuracy. This framework paves the way for ultrafast on-demand band-structure engineering, pointing toward new frontiers in quantum optoelectronics, precision measurement in molecular and biological systems, and attosecond control of matter.
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Peng Tan, Yuantao Chen, Yuqi Zhang, Hanyan Cheng, Guoyu Xian, Ming Cheng, Minghong Sun, Jiaxin Yin, Feifan Wang, Yaxian Wang, Yanjun Liu, Mingyuan Huang, Zhiwei Wang, Yugui Yao, Sheng Meng, Li Huang, Yanan Dai. 2025-11-20. Ultrafast {\mu}eV-Precision Bandgap Engineering in Low-Dimensional Topological Insulators. https://arxiv.org/abs/2511.16165
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