New Materials, New Functionalities: Molecular Beam Epitaxy of Ultra-High Conductivity Oxides

Abstract

Understanding fundamental properties of materials is necessary for all modern electronic technologies. Toward this end, the fabrication of new ultrapure thin film materials is critical to discover and understand novel properties that can allow further development of technology. Oxide materials are a vast material class abound with diverse properties, and, therefore, harnessing such phases is critical for realizing emerging technologies. Pushing forward, however, requires understanding basic properties of insulating, semiconducting and metallic oxides, as well as the more complex phases that arise out of strong electronic correlations unique to this class of materials. In this review, we will focus on one of the unique aspects of oxides: the ultra-high conductivity metallic state, which can be a critical component for future all-oxide microelectronics such as low-loss interconnects and gate-metals, spintronics, as well as future quantum technologies that employ emergent magnetic or superconducting ground states. Like most oxides, a critical challenge to understanding and ultimately integrating high-conductivity metals into new technologies is the ability to synthesize high-quality materials. Therefore, we will frame the discussions in the context of epitaxial film growth via molecular beam epitaxy (MBE), which has provided insights into the electronic behavior of specific materials while providing samples with unprecedented quality. We will highlight and underscore how MBE has enabled developments and deeper understanding of their properties and how it plays a critical role in the future of this unique class of materials.