Mechanistic Insights into the Early Stages of Oxidation at Copper Terrace: The Role of O-O Repulsion and Substrate-mediated Effects

Abstract

Copper-based catalysts play a crucial role in industrial oxidation reactions. Although many theoretical studies consider copper to be metallic, it is well established that copper readily oxides at ambient conditions, forming a passivating oxide layer. Experimental investigations spanning two decades have shown that in addition to the anticipated step-oxide formation, oxide can directly form at the Cu(111) terrace. The atomistically-resolved mechanism for direct oxidation at flat terraces remains unknown. Using density functional theory (DFT) calculations, we demonstrate that the formation of subsurface oxide occurs through a coordinated mechanism that takes place in the presence of specific clusters of adsorbed oxygen atoms. Certain oxygen atoms in the cluster function like pincers to extract a copper atom from the surface layer and induce localized surface restructuring. This process creates open channels that allow an oxygen atom to diffuse into the subsurface layer. The subsurface oxide formation is barrierless. This implies that the Cu oxide surface is highly dynamic. At low O coverages, subsurface oxidation is unlikely via step oxide growth nor direct terrace oxidation as the subsurface oxygen is unstable. Substrate mediated O-Cu-O adsorbate interactions govern the oxide stability. These insights provide a foundation for developing a more accurate dynamic models for copper catalysis.