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arXiv · 2502.11963

Weyl and Dirac Semimetals for Thermoelectric Applications

Saurabh Singh·Sarmistha Das·Shiv Kumar
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Abstract

Weyl and Dirac semimetals, characterized by their unique band structures with linear energy dispersion (E vs k) near the Fermi level (EF), have emerged as promising candidates for next-generation technology based on thermoelectric materials. Their exceptional electronic properties, notably high carrier mobility and substantial Berry curvature, offer the potential to surmount the limitations inherent in conventional thermoelectric materials. A comprehensive understanding of the fundamental physics underlying these materials is essential. This chapter mainly focused into the topological properties and distinctive electronic band structures of Weyl and Dirac semimetals, providing a theoretical framework for comprehending their thermoelectric transport properties such as Seebeck coefficients, electrical and thermal conductivity. The pivotal role of Berry curvature in enhancing Seebeck coefficients while reducing thermal conductivity is a key focus. Experimental advancements in synthesizing single crystals and characterizing these materials have been significant. Recent development in material growth and characterization techniques have propelled research forward. The intricate relationship between material properties, such as carrier concentration, electronic bandgap, and crystal structure, and thermoelectric performance is explored. Realizing the potential of Weyl and Dirac semimetals for practical thermoelectric applications necessitates overcoming specific challenges. This chapter outlines strategies to optimize thermoelectric figures of merit (ZT) through band engineering, carrier doping, and nanostructuring. Moreover, the exploration of hybrid materials and heterostructures offers promising avenues for enhancing thermoelectric performance for renewable energy applications.

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Saurabh Singh, Sarmistha Das, Shiv Kumar. 2025-02-17. Weyl and Dirac Semimetals for Thermoelectric Applications. https://arxiv.org/abs/2502.11963

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