Towards Improved Polarization Uniformity in Ferroelectric Hf$_{0.5}$Zr$_{0.5}$O$_2$ Devices within Back End of Line Thermal Budget for Memory and Neuromorphic Applications

Padma Srivari; Ella Paasio; Xinye Li; Sayani Majumdar

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arXiv · 2412.11288

Towards Improved Polarization Uniformity in Ferroelectric Hf$_{0.5}$Zr$_{0.5}$O$_2$ Devices within Back End of Line Thermal Budget for Memory and Neuromorphic Applications

Padma Srivari·Ella Paasio·Xinye Li·Sayani Majumdar

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Abstract

Thin film ferroelectric devices with ultralow power operation, non-volatile data retention and fast and reliable switching are attractive for non-volatile memory and as synaptic weight elements. However, low thermal budget ferroelectric oxides suffer from crystalline inhomogeneity and defects that makes their large-scale circuit integration challenging. Here, we report on the thermally engineered way to induce wafer-scale homogeneity in Hf$_{0.5}$Zr$_{0.5}$O$_2$ capacitors that can lead to high device reliability making their integration possible in ultralow power memory and neuromorphic computing hardware.

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Padma Srivari, Ella Paasio, Xinye Li, Sayani Majumdar. 2024-12-15. Towards Improved Polarization Uniformity in Ferroelectric Hf$_{0.5}$Zr$_{0.5}$O$_2$ Devices within Back End of Line Thermal Budget for Memory and Neuromorphic Applications. https://arxiv.org/abs/2412.11288

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