arXiv · 2406.14959
Uncovering the origin of interface stress enhancement and compressive-to-tensile stress transition in immiscible nanomultilayers
Abstract
The intrinsic stress in nanomultilayers (NMLs) is typically dominated by interface stress, which is particularly high in immiscible Cu/W NMLs. Here, atomistic simulations with a chemically-accurate neural network potential reveal the role of interfacial intermixing and metastable phase formation on the interface stress levels. These results rationalize an experimentally-reported compressive- to-tensile transition as a function of NML deposition conditions and the extremely high interface stresses under some conditions.
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Yang Hu, Giacomo Lorenzin, Jeyun Yeom, Manura Liyanage, William A. Curtin, Lars P. H. Jeurgens, Jolanta Janczak-Rusch, Claudia Cancellieri, Vladyslav Turlo. 2024-06-21. Uncovering the origin of interface stress enhancement and compressive-to-tensile stress transition in immiscible nanomultilayers. https://arxiv.org/abs/2406.14959
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