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arXiv · 2304.08339

Development of Nb-GaAs based superconductor semiconductor hybrid platform by combining in-situ dc magnetron sputtering and molecular beam epitaxy

Clemens Todt·Sjoerd Telkamp·Filip Krizek·Christian Reichl·Mihai Gabureac·Rüdiger Schott·Erik Cheah·Peng Zeng·Thomas Weber·Arnold Müller·Christof Vockenhuber·Mohsen Bahrami Panah·Werner Wegscheider
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Abstract

We present Nb thin films deposited in-situ on GaAs by combining molecular beam epitaxy and magnetron sputtering within an ultra-high vacuum cluster. Nb films deposited at varying power, and a reference film from a commercial system, are compared. The results show clear variation between the in-situ and ex-situ deposition which we relate to differences in magnetron sputtering conditions and chamber geometry. The Nb films have critical temperatures of around $9 \textrm{K}$. and critical perpendicular magnetic fields of up to $B_{c2} = 1.4 \textrm{T}$ at $4.2 \textrm{K}$. From STEM images of the GaAs-Nb interface we find the formation of an amorphous interlayer between the GaAs and the Nb for both the ex-situ and in-situ deposited material.

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Clemens Todt, Sjoerd Telkamp, Filip Krizek, Christian Reichl, Mihai Gabureac, Rüdiger Schott, Erik Cheah, Peng Zeng, Thomas Weber, Arnold Müller, Christof Vockenhuber, Mohsen Bahrami Panah, Werner Wegscheider. 2023-04-17. Development of Nb-GaAs based superconductor semiconductor hybrid platform by combining in-situ dc magnetron sputtering and molecular beam epitaxy. https://arxiv.org/abs/2304.08339

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