Single-exposure x-ray dark-field imaging: quantifying sample microstructure using a single-grid setup

Abstract

The size of the smallest detectable sample feature in an x-ray imaging system is usually restricted by the spatial resolution of the system. This limitation can now be overcome using the diffusive dark-field signal, which is generated by unresolved phase effects or the ultra-small-angle x-ray scattering from unresolved sample microstructures. A quantitative measure of this dark-field signal can be useful in revealing the microstructure size or material for medical diagnosis, security screening and materials science. Recently, we derived a new method to quantify the diffusive dark-field signal in terms of a scattering angle using a single-exposure grid-based approach. In this manuscript, we look at the problem of quantifying the sample microstructure size from this single-exposure dark-field signal. We do this by quantifying the diffusive dark-field signal produced by 5 different sizes of polystyrene microspheres, ranging from 1.0 $\mu$m to 10.8 $\mu$m, to investigate how the strength of the dark-field signal changes with the sample microstructure size, $S$. We also explore the feasibility of performing single-exposure dark-field imaging with a simple equation for the optimal propagation distance given microstructure with a specific size and thickness, and successfully verify this equation with experimental data. Our theoretical model predicts that the dark-field scattering angle is inversely proportional to $\sqrt{S}$, which is consistent with our experimental data.