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arXiv · 2211.01193

Utilizing the sensitization effect for direct laser writing in a novel photoresist based on the chitin monomer N-acetyl-D-glucosamine

Dominic T. Meiers·Maximilian Rothammer·Maximilian Maier·Cordt Zollfrank·Georg von Freymann
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Abstract

The great flexibility of direct laser writing arises from the possibility to fabricate precise three-dimensional structures on very small scales as well as the broad range of applicable materials. However, there is still a vast number of promising materials which are currently inaccessible requiring the continuous development of novel photoresists. Here, a new bio-sourced resist is reported which relies on the monomeric unit of chitin, N-acetyl-D-glucosamine, expanding the existing plant-based biopolymer resists by a bio-based monomer from the animal kingdom. In addition it is shown that combined use of two photoinitiators is advantageous over the use of a single one. In our approach, the first photoinitator is a good two-photon absorber at the applied wavelength, while the second photoinitiator exhibits poor two-photon absorbtion abilities, but is better suited for crosslinking of the monomer. The first photoinitiator absorbs the light acting as a sensitizer and transfers the energy to the second initiator, which subsequently forms a radical and initializes the polymerization. This sensitization effect enables a new route to utilize reactive photointiators with a small two-photon absorption cross-section for direct laser writing without changing their chemical structure.

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Dominic T. Meiers, Maximilian Rothammer, Maximilian Maier, Cordt Zollfrank, Georg von Freymann. 2022-11-02. Utilizing the sensitization effect for direct laser writing in a novel photoresist based on the chitin monomer N-acetyl-D-glucosamine. https://arxiv.org/abs/2211.01193

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