Enchanced reflectance SiN$_x$ / SiO$_x$ DBR mirror based on TEOS precursor fabricated by PECVD method

I. M. Asharchuk; M. V. Shibalov; A. M. Mumlyakov; P. A. Nekludova; G. D. Diudbin; E. V. Zenova; N. V. Minaev; A. A. Pavlov; M. A. Tarkhov

arXiv · 2112.12525

Enchanced reflectance SiN$_x$ / SiO$_x$ DBR mirror based on TEOS precursor fabricated by PECVD method

I. M. Asharchuk·M. V. Shibalov·A. M. Mumlyakov·P. A. Nekludova·G. D. Diudbin·E. V. Zenova·N. V. Minaev·A. A. Pavlov·M. A. Tarkhov

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Abstract

In this study, we investigated the influence of silicon oxide roughness produced from the gas precursor monosilane (SiH$_4$) and the silicon-organic precursor tetraethoxysilane (TEOS) on the optical qualities of a distributed Bragg reflector (DBR). A significant influence of the precursors from which SiOx is deposited on the optical qualities of DBR mirrors is demonstrated in this study. It has been shown experimentally that a mirror produced from the TEOS precursor is endowed with better qualities than a mirror produced using SiH4, that is, the reflectivity increased by 20% and optical losses decreased by half. The roughness average (Ra) of the SiN$_x$/SiO$_x$ / (TEOS) mirror surface decreased by a factor of five compared to that of the SiN$_x$/SiO$_x$ / (SiH4) mirror

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I. M. Asharchuk, M. V. Shibalov, A. M. Mumlyakov, P. A. Nekludova, G. D. Diudbin, E. V. Zenova, N. V. Minaev, A. A. Pavlov, M. A. Tarkhov. 2021-12-22. Enchanced reflectance SiN$_x$ / SiO$_x$ DBR mirror based on TEOS precursor fabricated by PECVD method. https://arxiv.org/abs/2112.12525

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