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arXiv · 2006.06319

Helium Incorporation Stabilized Direct-gap Silicides

Shicong Ding·Jingming Shi·Jiahao Xie·Wenwen Cui·Pan Zhang·Kang Yang·Jian Hao·Meiling Xu·Qingxin Zeng·Lijun Zhang·Yinwei Li
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Abstract

The search of direct-gap Si-based semiconductors is of great interest due to the potential application in many technologically relevant fields. This work examines the incorporation of He as a possible route to form a direct band gap in Si. Structure predictions and first-principles calculations have shown that He reacts with Si at high pressure, to form the stable compounds Si2He and Si3He. Both compounds have host-guest structures consisting of a channel-like Si host framework filled with He guest atoms. The Si frameworks in two compounds could be persisted to ambient pressure after removal of He, forming two pure Si allotropes. Both Si-He compounds and both Si allotropes exhibit direct or quasi-direct band gaps of 0.84-1.34 eV, close to the optimal value (~1.3 eV) for solar cell applications. Analysis shows that Si2He with an electric-dipole-transition allowed band gap possesses higher absorption capacity than diamond cubic Si, which makes it to be a promising candidate material for thin-film solar cell.

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Shicong Ding, Jingming Shi, Jiahao Xie, Wenwen Cui, Pan Zhang, Kang Yang, Jian Hao, Meiling Xu, Qingxin Zeng, Lijun Zhang, Yinwei Li. 2020-06-11. Helium Incorporation Stabilized Direct-gap Silicides. https://arxiv.org/abs/2006.06319

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