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arXiv · 1909.03635

Nb$_{2}$SiTe$_{4}$: A Stable Narrow-Gap Two-Dimensional Material with Ambipolar Transport and Mid-Infrared Response

Mingxing Zhao·Wei Xia·Yang Wang·Man Luo·Zhen Tian·Yanfeng Guo·Weida Hu·Jiamin Xue
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Abstract

Two-dimensional (2D) materials with narrow band gaps (~0.3 eV) are of great importance for realizing ambipolar transistors and mid-infrared (MIR) detection. However, most of the 2D materials studied so far have band gaps that are too large. A few of them with suitable band gaps are not stable under ambient conditions. In this study, the layered Nb$_{2}$SiTe$_{4}$ is shown to be a stable 2D material with a band gap of 0.39 eV. Field-effect transistors based on few-layer Nb$_2$SiTe$_4$ show ambipolar transport with similar magnitude of electron and hole current and high charge-carrier mobility of ~ 100 cm$^{2}$V$^{-1}$s$^{-1}$ at room temperature. Optoelectronic measurements of the devices show clear response to MIR wavelength of 3.1 $\mathrmμ$m with a high responsivity of ~ 0.66 AW$^{-1}$. These results establish Nb$_{2}$SiTe$_{4}$ as a good candidate for ambipolar devices and MIR detection.

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Mingxing Zhao, Wei Xia, Yang Wang, Man Luo, Zhen Tian, Yanfeng Guo, Weida Hu, Jiamin Xue. 2019-09-09. Nb$_{2}$SiTe$_{4}$: A Stable Narrow-Gap Two-Dimensional Material with Ambipolar Transport and Mid-Infrared Response. https://arxiv.org/abs/1909.03635

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