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arXiv · 1802.05259

Predicting Scattering Scanning Near-field Optical Microscopy of Mass-produced Plasmonic Devices

Lauren M. Otto·Stanley P. Burgos·Matteo Staffaroni·Shen Ren·Ozgun Suzer·Barry C. Stipe·Paul D. Ashby·Aeron T. Hammack
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Abstract

Scattering scanning near-field optical microscopy enables optical imaging and characterization of plasmonic devices with nanometer-scale resolution well below the diffraction limit. This technique enables developers to probe and understand the waveguide-coupled plasmonic antenna in as-fabricated heat-assisted magnetic recording heads. In order validate and predict results and to extract information from experimental measurements that is physically comparable to simulations, a model was developed to translate the simulated electric field into expected near-field measurements using physical parameters specific to scattering scanning near-field optical microscopy physics. The methods used in this paper prove that scattering scanning near-field optical microscopy can be used to determine critical sub-diffraction-limited dimensions of optical field confinement, which is a crucial metrology requirement for the future of nano-optics, semiconductor photonic devices, and biological sensing where the near-field character of light is fundamental to device operation.

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BibTeXRIS

Lauren M. Otto, Stanley P. Burgos, Matteo Staffaroni, Shen Ren, Ozgun Suzer, Barry C. Stipe, Paul D. Ashby, Aeron T. Hammack. 2018-02-14. Predicting Scattering Scanning Near-field Optical Microscopy of Mass-produced Plasmonic Devices. https://doi.org/10.1063/1.5032222

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