arXiv · 1802.05208
2D-3D crossover in a dense electron liquid in silicon
Abstract
Doping of silicon via phosphene exposures alternating with molecular beam epitaxy overgrowth is a path to Si:P substrates for conventional microelectronics and quantum information technologies. The technique also provides a new and well-controlled material for systematic studies of two-dimensional lattices with a half-filled band. We show here that for a dense ($n_s=2.8\times 10^{14}$\,cm$^{-2}$) disordered two-dimensional array of P atoms, the full field angle-dependent magnetostransport is remarkably well described by classic weak localization theory with no corrections due to interaction effects. The two- to three-dimensional cross-over seen upon warming can also be interpreted using scaling concepts, developed for anistropic three-dimensional materials, which work remarkably except when the applied fields are nearly parallel to the conducting planes.
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Guy Matmon, Eran Ginossar, Byron J. Villis, Alex Kölker, Tingbin Lim, Hari Solanki, Steven R. Schofield, Neil J. Curson, Juerong Li, Ben N. Murdin, Andrew J. Fisher, Gabriel Aeppli. 2018-02-14. 2D-3D crossover in a dense electron liquid in silicon. https://doi.org/10.1103/physrevb.97.155306
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