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arXiv · 1705.05971

Ultra-low-loss Polaritons in Isotopically Pure Materials: A New Approach

Alexander J. Giles·Siyuan Dai·Igor Vurgaftman·Timothy Hoffman·Song Liu·Lucas Lindsay·Chase T. Ellis·Nathanael Assefa·Ioannis Chatzakis·Thomas L. Reinecke·Joseph G. Tischler·Michael M. Fogler·J. H. Edgar·D. N. Basov·Joshua D. Caldwell
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Abstract

Conventional optical components are limited to size-scales much larger than the wavelength of light, as changes in the amplitude, phase and polarization of the electromagnetic fields are accrued gradually along an optical path. However, advances in nanophotonics have produced ultra-thin, co-called "flat" optical components that beget abrupt changes in these properties over distances significantly shorter than the free space wavelength. While high optical losses still plague many approaches, phonon polariton (PhP) materials have demonstrated long lifetimes for sub-diffractional modes in comparison to plasmon-polariton-based nanophotonics. We experimentally observe a three-fold improvement in polariton lifetime through isotopic enrichment of hexagonal boron nitride (hBN). Commensurate increases in the polariton propagation length are demonstrated via direct imaging of polaritonic standing waves by means of infrared nano-optics. Our results provide the foundation for a materials-growth-directed approach towards realizing the loss control necessary for the development of PhP-based nanophotonic devices.

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Alexander J. Giles, Siyuan Dai, Igor Vurgaftman, Timothy Hoffman, Song Liu, Lucas Lindsay, Chase T. Ellis, Nathanael Assefa, Ioannis Chatzakis, Thomas L. Reinecke, Joseph G. Tischler, Michael M. Fogler, J. H. Edgar, D. N. Basov, Joshua D. Caldwell. 2017-05-17. Ultra-low-loss Polaritons in Isotopically Pure Materials: A New Approach. https://doi.org/10.1038/nmat5047

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