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arXiv · 1701.02380

Hybrid cold and hot-wall chamber for fast synthesis of uniform graphene

Hadi Arjmandi-Tash·Nikita Lebedev·Pauline van Deursen·Jan Aarts·Grégory F. Schneider
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Abstract

We introduce a novel modality in the CVD growth of graphene which combines the cold-wall and hot-wall reaction chambers. This hybrid mode preserves the advantages of a cold-wall chamber as the fast growth and low fuel consumption, but boosts the quality of the growth towards conventional CVD with hot-wall chambers. The synthesized graphene is uniform and monolayer. The electronic transport measurements shows great improvements in charge carrier mobility compared to graphene synthesized in a normal cold-wall reaction chamber. Our results promise the development of a fast and cost-efficient growth of high quality graphene, suitable for scalable industrial applications.

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Hadi Arjmandi-Tash, Nikita Lebedev, Pauline van Deursen, Jan Aarts, Grégory F. Schneider. 2017-01-09. Hybrid cold and hot-wall chamber for fast synthesis of uniform graphene. https://arxiv.org/abs/1701.02380

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