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arXiv · 1505.04496

Magnetic Resonance Lithography with Nanometer Resolution

Fahad AlGhannam·Philip Hemmer·Zeyang Liao·M. Suhail Zubairy
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Abstract

We propose an approach for super-resolution optical lithography which is based on the inverse of magnetic resonance imaging (MRI). The technique uses atomic coherence in an ensemble of spin systems whose final state population can be optically detected. In principle, our method is capable of producing arbitrary one and two dimensional high-resolution patterns with high contrast.

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Fahad AlGhannam, Philip Hemmer, Zeyang Liao, M. Suhail Zubairy. 2015-05-18. Magnetic Resonance Lithography with Nanometer Resolution. https://arxiv.org/abs/1505.04496

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