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arXiv · 1502.02703

Third generation residual gas ionization profile monitors at Fermilab

J. R. Zagel·M. Alvarez·B. Fellenz·C. Jensen·C. Lundberg·E. McCrory·D. Slimmer·R. Thurman-Keup·D. Tinsley
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Abstract

The latest generation of IPMs installed in the Fermilab Main Injector and Recycler incorporate a 1 kG permanent magnet, a newly designed high-gain, rad-tolerant preamp, and a control grid to moderate the charge that is allowed to arrive on the anode pick-up strips. The control grid is intended to select a single Booster batch measurement per turn. Initially it is being used to allow for a faster turn-on of a single, high-intensity cycle in either machine. The expectation is that this will extend the Micro Channel Plate lifetime, which is the high-cost consumable in the measurement system. We discuss the new design and data acquired with this system.

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J. R. Zagel, M. Alvarez, B. Fellenz, C. Jensen, C. Lundberg, E. McCrory, D. Slimmer, R. Thurman-Keup, D. Tinsley. 2015-02-09. Third generation residual gas ionization profile monitors at Fermilab. https://arxiv.org/abs/1502.02703

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