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arXiv · 1412.4356

X-ray and neutron reflectometry study of copper surface reconstruction caused by implantation of high-energy oxygen ions

Yu. N. Khaydukov·O. Soltwedel·Yu. A. Marchenko·D. Yu. Khaidukova·A. Csik·T. Acartürk·U. Starke·T. Keller·A. G. Guglya·Kh. R. Kazdayev
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Abstract

Combination of neutron and X-ray reflectometry was used to study the vertical structure of 100 nm-thin copper films with implanted oxygen ions of energy E = [10-30] keV and doses D=[0.2-5.4]x$10^{16}$ $cm^{-2}$. The study shows that oxygen ion implantation with an energy of E = 30 keV leads to the formation of a 3 nm thick layer on the surface. Density and copper/oxygen stoichiometry of the observed surface layer are close to $Cu_2O$ oxide. We attribute the $Cu_2O$ oxide formation to highly mobilized copper atoms generated by stimulated ion implantation.

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Yu. N. Khaydukov, O. Soltwedel, Yu. A. Marchenko, D. Yu. Khaidukova, A. Csik, T. Acartürk, U. Starke, T. Keller, A. G. Guglya, Kh. R. Kazdayev. 2014-12-14. X-ray and neutron reflectometry study of copper surface reconstruction caused by implantation of high-energy oxygen ions. https://doi.org/10.1134/s1027451017010293

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