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arXiv · 1402.1737

Lithography-free sub-100nm nanocone array antireflection layer for low-cost silicon solar cell

Zhida Xu·Logan Liu
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Abstract

High density and uniformity sub-100nm surface oxidized silicon nanocone forest structure is created and integrated onto the existing texturization microstructures on photovoltaic device surface by a one-step high throughput plasma enhanced texturization method. We suppressed the broadband optical reflection on chemically textured grade-B silicon solar cells for up to 70.25% through this nanomanufacturing method. The performance of the solar cell is improved with the short circuit current increased by 7.1%, fill factor increased by 7.0%, conversion efficiency increased by 14.66%. Our method demonstrates the potential to improve the photovoltaic device performance with low cost high and throughput nanomanufacturing technology.

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Zhida Xu, Logan Liu. 2014-02-07. Lithography-free sub-100nm nanocone array antireflection layer for low-cost silicon solar cell. https://doi.org/10.1364/ao.51.004430

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