Fabrication of High Aspect Ratio Micro-Penning-Malmberg Gold Plated Silicon Trap Arrays

Abstract

Acquiring a portable high density charged particles trap might consist of an array of micro-Penning-Malmberg traps (microtraps) with substantially lower end barriers potential than conventional Penning-Malmberg traps [1]. We report on the progress of the fabrication of these microtraps designed for antimatter storage such as positrons. The fabrication of large length to radius aspect ratio (1000:1) microtrap arrays involved advanced techniques including photolithography, deep reactive ion etching (DRIE) of silicon wafers to achieve through-vias, gold sputtering of the wafers on the surfaces and inside the vias, and thermal compression bonding of the wafers. This paper describes the encountered issues during fabrication and addresses geometry errors and asymmetries. In order to minimize the patch effects on the lifetime of the trapped positrons, the bonded stacks were gold electroplated to achieve a uniform gold surface. We show by simulation and analytical calculation that how positrons confinement time depends on trap imperfections.