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arXiv · 1303.1353

Highly reproducible metal/graphene contacts and stable electrical performance by UV-Ozone treatment

Wei Li·Christina A. Hacker·Yiran Liang·Curt A. Richter·David J. Gundlach·Xuelei Liang·Lianmao Peng
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Abstract

Resist residue from the device fabrication process is a general and significant source of the metal/graphene contact interface contamination. In this paper, Ultraviolet-Ozone (UVO) treatment is proven to be an effective way of cleaning the metal/graphene interface. Electrical measurements of devices, which were fabricated by using UVO treatment of the metal/graphene contact region, show that stable and highly reproducible low contact resistance between metal and graphene is obtained without affecting the electrical properties of the graphene channel itself.

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Wei Li, Christina A. Hacker, Yiran Liang, Curt A. Richter, David J. Gundlach, Xuelei Liang, Lianmao Peng. 2013-03-06. Highly reproducible metal/graphene contacts and stable electrical performance by UV-Ozone treatment. https://arxiv.org/abs/1303.1353

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