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arXiv · 1209.4226

Thulium and ytterbium-doped titanium oxide thin films deposited by ultrasonic spray pyrolysis

S. Forissier·H. Roussel·P. Chaudouet·A. Pereira·J. -L. Deschanvres·B. Moine
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Abstract

Thin films of thulium and ytterbium-doped titanium oxide were grown by metal-organic spray pyrolysis deposition from titanium(IV)oxide bis(acetylacetonate), thulium(III) tris(2,2,6,6-tetramethyl-3,5-heptanedionate) and ytterbium(III) tris(acetylacetonate). Deposition temperatures have been investigated from 300°C to 600°C. Films have been studied regarding their crystallity and doping quality. Structural and composition characterisations of TiO2:Tm,Yb were performed by electron microprobe, X-ray diffraction and Fourier transform infrared spectroscopy. The deposition rate can reach 0.8 \mum/h. The anatase phase of TiO2 was obtained after synthesis at 400°C or higher. Organic contamination at low deposition temperature is eliminated by annealing treatments.

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S. Forissier, H. Roussel, P. Chaudouet, A. Pereira, J. -L. Deschanvres, B. Moine. 2012-09-19. Thulium and ytterbium-doped titanium oxide thin films deposited by ultrasonic spray pyrolysis. https://doi.org/10.1007/s11666-012-9813-7

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