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arXiv · 1203.5655

Electrochemical integration of graphene with light absorbing copper-based thin films

Medini Padmanabhan·Kallol Roy·Gopalakrishnan Ramalingam·Srinivasan Raghavan·Arindam Ghosh
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Abstract

We present an electrochemical route for the integration of graphene with light sensitive copper-based alloys used in optoelectronic applications. Graphene grown using chemical vapor deposition (CVD) transferred to glass is found to be a robust substrate on which photoconductive Cu_{x}S films of 1-2 um thickness can be deposited. The effect of growth parameters on the morphology and photoconductivity of Cu_{x}S films is presented. Current-voltage characterization and photoconductivity decay experiments are performed with graphene as one contact and silver epoxy as the other.

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Medini Padmanabhan, Kallol Roy, Gopalakrishnan Ramalingam, Srinivasan Raghavan, Arindam Ghosh. 2012-03-26. Electrochemical integration of graphene with light absorbing copper-based thin films. https://doi.org/10.1021/jp208120u

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