arXiv · 1111.4406
A hybrid double-dot in silicon
Abstract
We report electrical measurements of a single arsenic dopant atom in the tunnel-barrier of a silicon SET. As well as performing electrical characterization of the individual dopant, we study series electrical transport through the dopant and SET. We measure the triple points of this hybrid double dot, using simulations to support our results, and show that we can tune the electrostatic coupling between the two sub-systems.
Explore related subjects
Keep this discovery
M. Fernando Gonzalez-Zalba, Dominik Heiss, Andrew J. Ferguson. 2011-11-18. A hybrid double-dot in silicon. https://doi.org/10.1088/1367-2630/14/2/023050
Cite the original work for its findings. Save a collection to share your selection of sources.