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arXiv · 1102.3084

Saturation of front propagation in a reaction-diffusion process describing plasma damage in porous low-k materials

Soghra Safaverdi·Gerard T. Barkema·Eddy Kunnen·Adam M. Urbanowicz·Christian Maes
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Abstract

We propose a three-component reaction-diffusion system yielding an asymptotic logarithmic time-dependence for a moving interface. This is naturally related to a Stefan-problem for which both one-sided Dirichlet-type and von Neumann-type boundary conditions are considered. We integrate the dependence of the interface motion on diffusion and reaction parameters and we observe a change from transport behavior and interface motion \sim t^1/2 to logarithmic behavior \sim ln t as a function of time. We apply our theoretical findings to the propagation of carbon depletion in porous dielectrics exposed to a low temperature plasma. This diffusion saturation is reached after about 1 minute in typical experimental situations of plasma damage in microelectronic fabrication. We predict the general dependencies on porosity and reaction rates.

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Soghra Safaverdi, Gerard T. Barkema, Eddy Kunnen, Adam M. Urbanowicz, Christian Maes. 2011-06-01. Saturation of front propagation in a reaction-diffusion process describing plasma damage in porous low-k materials. https://doi.org/10.1103/physrevb.83.245320

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