arXiv · 1101.3714
Negative differential resistance in scanning tunneling microscopy: simulations on C$_{60}$-based molecular overlayers
Abstract
We determine the conditions in which negative differential resistance (NDR) appears in the C$_{60}$-based molecular device of [Phys. Rev. Lett. {\bf 100}, 036807 (2008)] by means of ab-initio electron-transport simulations. Our calculations grant access to bias-dependent intrinsic properties of the molecular device, such as electronic levels and their partial widths. We show that these quantities depend on the molecule-molecule and molecule-electrode interactions of the device. Hence, NDR can be tuned by modifying the bias behavior of levels and widths using both types of interactions.
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Frederico D. Novaes, Manuel Cobian, Alberto Garcia, Pablo Ordejon, Hiromu Ueba, Nicolas Lorente. 2011-01-19. Negative differential resistance in scanning tunneling microscopy: simulations on C$_{60}$-based molecular overlayers. https://arxiv.org/abs/1101.3714
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