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arXiv · 1010.4102

Graphite Nanoeraser

Ze Liu·Peter. Bøggild·Jia-rui Yang·Yao Cheng·Francois Grey·Yi-lun Liu·Li Wang·Quan-shui Zheng
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Abstract

We present here a method for cleaning intermediate-size (5~50nm) contamination from highly oriented pyrolytic graphite. Electron beam deposition causes a continuous increase of carbonaceous material on graphene and graphite surfaces, which is difficult to remove by conventional techniques. Direct mechanical wiping using a graphite nanoeraser is observed to drastically reduce the amount of contamination. After the mechanical removal of contamination, the graphite surfaces were able to self-retract after shearing, indicating that van der Waals contact bonding is restored. Since contact bonding provides an indication of a level of cleanliness normally only attainable in a high-quality clean-room, we discuss potential applications in preparation of ultraclean surfaces.

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Ze Liu, Peter. Bøggild, Jia-rui Yang, Yao Cheng, Francois Grey, Yi-lun Liu, Li Wang, Quan-shui Zheng. 2010-10-20. Graphite Nanoeraser. https://doi.org/10.1088/0957-4484%2F22%2F26%2F265706

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